Adixen Vacuum Products

Alcatel Lucent

Alcatel

Pfeiffer Vacuum Gmbh

Arnaud Favre

Julien Bounouar

Bertrand Bellet

Erwan Godot

Xavier Metais

Roland Bernard

Jean-Pierre Desbiolles

Cindy Thovex

Julien Palisson

Remi Thollot

Sylvain Rioufrays

Magali Davenet

Jean-Marie Foray

Francoise Desbiolles, Legal Representative

Rémi Thollot

The present invention relates to a station for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, said transport carrier comprising a rigid casing () containing an aperture and a removable door () allowing the aperture to be closed, the measuring station comprising: The invention also relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure.

Station and method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure

A device for handling substrates within a semiconductor manufacturing plant having substrate processing equipments, substrate storage means, substrate transport means, and a manufacturing execution system (MES) functionally related with the substrate processing equipments, the substrate storage means and the substrate transport means, including at least one substrate storage and transport box that is transported by the transport means and stored in the storage means; at least one gas analysis device of the gases forming the internal atmosphere of the substrate storage and transport box, which produces analysis signals representative of the quantity of the critical gas that is likely to generate molecular contamination, which is present in the storage and transport box; and an execution device which pilots the transport means and the storage means, with the execution device comprising instructions for detecting a molecular decontamination need as a function of analysis signals emitted by the gas analysis device.

Method and device for controlling the manufacture of semiconductor by measuring contamination

A device for pumping and treating gases is disclosed. The device features a stator having a plurality of pumping stages connected in series one after another between a suction side and a delivery side by the inter-stage ducts. The device also includes an inner tube and a blind outer tube, the tubes inserted one inside the other and made of ceramic material, the inner tube connected to the delivery side of the rotor housing of a pumping stage and the outer tube connected to the stator and communicating with at least one inter-stage duct formed in the stator, the tubes defining a path for the pumped gases. The device also includes a plasma source located outside the stator to generate a plasma in the path of the pumped gases.

Gas pumping and treatment device

A treatment device for transport and storage boxes according to the invention comprises a plurality of decontamination modules (-) supported by a common chassis () and arranged in a row of at least one column () of modules superposed one on top of the other. Each decontamination module (-) comprises its own pumping means () having at least a primary pump () housed in a primary pumping compartment () that is longitudinally offset from the decontamination chamber (). Access to the decontamination modules (-) is had via side access doors which are all oriented on one and the same access side and which are acted upon by actuating means that automatically close and open them. A lateral transfer zone is provided on the access side, and comprises a robot () capable of moving the transport and storage boxes between a frontal loading-unloading station () and the decontamination chambers () of each of the decontamination modules (-). The amount of space occupied by and the throughput of the treatment device () are thus optimized.

Treatment device for transport and storage boxes

The photomask manufacturing method comprises at least one step of cleaning the photomask and at least one step of placing a protective pellicle onto the photomask at the end of manufacturing. The inventive method further comprises at least one step of removing ammonia and sulfate residue between the cleaning step and the pellicle placement step. This step comprises the following operations: The device for implementing the inventive method comprises a sealed chamber containing at least one photomask, a pumping unit for creating and maintaining a vacuum inside the chamber, a system for holding at least one photomask, placed inside the sealed chamber, infrared radiation means and a gas injection system.

Method for manufacturing photomasks and device for its implementation

The invention concerns a measurement station for the measurement of particle contamination of a transport pod for the conveyance and atmospheric storage of semiconductor substrates, such pod comprising a casing capable of being closed by means of a removable access door, such station comprising: The invention also concerns a method for the measurement of particle contamination of a transport pod for the conveyance and atmospheric storage of semiconductor substrates.

Contamination measurement station and method for a semiconductor substrates transport pod

The subject of the present invention is a method for removing pollution from a confined environment containing an interior space bounded by a wall, involving the following steps: the confined environment which has a leak is placed in a sealed chamber having for example an inlet for introducing a gas and a pump for pumping a gas and the gas contained in the chamber and the gas contained inside the space are simultaneously pumped through the leak so that the pressure difference across the wall is always below a wall damaging threshold. Another subject of the invention is a related device for removing pollution from a confined environment.

Method and device for removing pollution from a confined environment

A device is used to measure contamination directly in transport enclosures of FOUP or SMIF type, for example. The transport enclosure is placed on an adapter that sets up direct communication between it and an external gas analyzer. The gas analyzer ionizes the sampled gases and performs the analysis by measuring a parameter of the ions resulting from this ionization. This measures very low levels of gaseous contamination in real time.

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Annecy, France

Arnaud Favre