Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Carl Zeiss Laser Optics Gmbh

Asml Netherlands B.v.

Armin Schoeppach

Johannes Rau

Jens Kugler

Bernhard Gellrich

Ulrich Weber

Bernhard Geuppert

Hubert Holderer

Stefan Hembacher

Juergen Fischer

Thomas Petasch

Thorsten Rassel

Gerhard Fuerter

Norbert Muehlberger

Martin Mahlmann

Matthias Orth

Hans-Juergen Mann

Guido Limbach

Christian Zengerling

Stefan Xalter

Aksel Goehnermeier

Ulrich Loering

Franz Sorg

Dirk Hellweg

Johannes Zellner

Ulrich Bingel

Armin Werber

Gerd Klose

Gennady Fedosenko

Stefan Wiesner

Leonid Gorkhover

Claudia Ekstein

Juergen Huber

Michael Widmann

Manfred Steinbach

Guenter Albrecht

Hans-Joachim Trefz

Peter Meyer

Toralf Gruner

Yim-Bun Patrick Kwan

Alexander Kohl

Johannes Lippert

Andreas Wurmbrand

Timo Laufer

Winfried M Kaiser

Frank Eisert

Erwin Gaber

Reiner Garreis

Chris Reed

Dragos Pariza

Mike Meehan

Josef Distl

Stephane Bruynooghe

Johnannes Rau

An optical projection unit includes first and second optical element modules. The first optical element module includes a first housing unit and a first optical element received within the first housing unit and having an optically used first region defining a first optical axis. The second optical element module is located adjacent to the first optical element module and includes a second optical element which defines a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is laterally offset and/or inclined with respect to the first housing axis. The first housing axis is substantially collinear with the second optical axis.

Optical projection system

The disclosure relates to an optical device, in particular for microlithography. The optical device includes an optical module and a support structure that supports the optical module. The optical module includes an optical element and a holding device that holds the optical element. The holding device includes a deformation device having a plurality of active deformation units which contact the optical element and which are designed so as to impose a pre-defined deformation on the optical element. The optical module is fixed to the support structure in a replaceable manner.

Optical device having a deformable optical element

An actuator includes a housing, a movable part, and an advancing unit that is at least temporarily connected to the movable part. The advancing unit includes a deformation unit and a deformer configured to deform the deformation unit with a vector component perpendicular to an effective direction of the actuator so that a total length of the deformation unit changes in the effective direction of the actuator as a result of the deformation. The movable part is configured to move in the effective direction of the actuator upon a removal of the vector component on the deformation unit and the deformation unit is disposed along the effective direction of the actuator upon the removal of the vector component on the deformation unit.

Actuators and microlithography projection exposure systems and methods using the same

A method and a device for the material-fit connection of an optical element to a frame are disclosed.

Method and device for connecting an optical element to a frame

A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.

Projection exposure apparatus for microlithography for the production of semiconductor components

An optical arrangement includes at least one optical element and a support element for the optical element. The optical element and the support element are connected together by way of at least three decoupling elements. The decoupling elements are formed monolithically with the optical element and with the support element.

Optical arrangement and microlithographic projection exposure apparatus including same

A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.

Gravitation compensation for optical elements in projection exposure apparatuses

An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of the illumination system are relatively low.

Microlithographic imaging optical system including multiple mirrors

An optical module, in particular for microlithography, with an optical element unit, a support device, a deformation device and a measuring device is disclosed. The support device is supported on the optical element unit, whereas for deforming an optical surface of the optical element unit, the deformation device engages a deformation section of the optical element unit comprising the optical surface. For determining the position and/or the orientation of the optical element unit with respect to an external reference in at least one degree of freedom, the measuring device comprises at least one measuring element, wherein the measuring element is arranged on a reference section of the optical element unit.

Optical module with a measuring device

An optical projection system for a microlithography system includes a light path, a first lens unit receiving a first part of the light path, a second lens unit receiving a second part of the light path, and a support unit supporting the first and second lens units. The first and second lens units are elongated lens units including a plurality of lenses. The support unit includes a housing receiving a third part of the light path and enclosing a reflective element. The housing includes first and second interfaces. The first interface is a first support interface supporting the first lens unit. The second interface is a second support interface supporting the second lens unit at a location substantially opposite to the first interface.

Growing community of inventors

Aalen, Germany

Armin Schoeppach