Asml Netherlands B.v.

Armin Ridinger

Georgiy Olegovich Vaschenko

Peter Michael Baumgart

Chirag Rajyaguru

Benjamin Sams

Kyle John Scaffidi

Janine Kardokus

Timothy Richard Palmer

Nicolas John Ledesma

Thomas Halloran

Michael Arthur Perry, Jr

An apparatus includes: a mechanically insulating device including a flexible bellows () extending between first and second flanges () and defining a bellows passageway that extends along an axial direction between openings of the first and second flanges; a rigid inner sleeve () affixed to or supported by the first flange and extending along the bellows passageway in the axial direction; and a shield device (including i.a.). The rigid inner sleeve has an outer diameter that is less than an inner diameter of the flexible bellows. The shield device is at least partly fixed to or supported by the second flange and defines an axial device opening having a diameter that is less than the inner diameter of the flexible bellows and is greater than the outer diameter of the rigid inner sleeve. The shield device is configured to block particulates from entering a region between the flexible bellows and the rigid inner sleeve.

Contamination shield for mechanically insulating device

A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.

Method of purifying target material for an EUV light source

A system and method for cleaning a sintered filter includes a cleaning fluid source and a cleaning nozzle. The cleaning nozzle includes an inlet end coupled to the cleaning fluid source and at least one outlet port for outputting the cleaning fluid injected through the cleaning nozzle. The outlet port is disposed proximate to an outlet end of the cleaning nozzle. The cleaning nozzle has an external width less than an internal width of the sintered filter to be cleaned. The cleaning nozzle has a nozzle length greater than a full depth of the sintered filter to be cleaned. The outlet port can be disposed in a side of the cleaning nozzle proximate to the outlet end of the cleaning nozzle. The outlet port can include more than one outlet ports.

System method and apparatus for high pressure liquid jet cleaning of sintered filters

Method and apparatus for purifying target material for EUV light source

A target material receptacle includes a structure including a passageway that extends in a first direction, the passageway configured to receive target material that travels along a target material path; and a deflector system configured to receive target material from the passageway. The deflector system includes a plurality of deflector elements. Each deflector element is oriented at a first acute angle relative to a direction of travel of an instance of the target material that travels along the target material path, and each deflector element in the deflector system is separated from a nearest deflector element by a distance along a second direction that is different from the first direction.

Receptacle for capturing material that travels on a material path

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San Diego, CA, United States of America

Armin Ridinger