Thomson-csf

Armand Eranian

Jean-Claude Dubois

Maryse Gazard

Francoise Barre

Jean Claude Dubois

Andre Couttet

Evelyne Datamanti

Brigitte Loiseaux

Jean Pierre Huignard

Claude Duchesne

Paul Paimblant

This invention concerns a process for producing diffracting phase structures in an interaction medium, which is formed of microballs of material in suspension in a polymerizable liquid. When illumination rings have been recorded by the interference of two light waves, they are fixed in situ by exposing the mixture to ultraviolet radiation.

Process for producing diffracting phase structures

A family of negative resins, capable of undergoing crosslinking under the effect of more or less energetic photons (gamma radiation, X-rays, ultraviolet or visible light), applicable to the protection of objects against atmospheric agents and to the production of masks of the type used in the production of integrated circuits. The typical compound according to the invention contains at least one substance of which the chemical formula comprises a thiirane ring: ##STR1## such as 2,3-epithiopropyl methacrylate copolymerized with a vinyl monomer, such as methyl methacrylate. Crosslinking is facilitated by photoinitiators, such as aryl diazonium and aryl iodonium salts liberating Lewis acids. By selecting the photoinitiator, it is possible to act on the spectral region where irradiation is effective.

Family of compounds crosslinkable by photon irradiation

A polymerized resin capable, upon electronic irradiation, of undergoing a cross-linking completing the polymerization and rendering it insoluble in certain solvents. Such a negative resin is ten times more sensitive to electrons than the best known resin. It is obtained by copolymerization of an epithiopropylmethacrylate: ##STR1## and of a vinyl monomer such as methyl methacrylate.

Method for making electron sensitive negative resist

A resin crosslinkable by electron or photon irradiation (gamma rays, X-rays or ultraviolet rays), which is (after crosslinking) very stable under the action of ambient light and heat. It contains a substance the chemical formula of which comprises a thietane ring: ##STR1## notably a compound of the methacrylic ester polymer type wherein the monomer has the general formula: ##STR2## wherein n may be zero or equal to an integer from 1 to 10. The process for using such a resin consists of dissolving it in a solvent, then applying a thin layer of the solution on the object to be coated and finally treating the coating by irradiation.

Resin with a thietane ring, crosslinkable by electron photon

Two members, at least one member being permeable to ultraviolet radiation are glued together by means of a photopolymerizable substance deposited in layer form on and exposed to radiation through the permeable member. This substance comprises various vinyl monomers, soluble reactive polymers and a photosensitive catalyst, whereby at least one of the monomers or reactive polymers has a thi-irane cycle as part of its structure.

Process for gluing two members using a photopolymerizable substance

The invention relates to resins used for manufacturing or reproducing masks in electronics. The photomasking composition corresponds to the general formula: ##STR1## in which R.sub.1, R.sub.1 ', R.sub.1 ', R.sub.2, R.sub.2 ', R.sub.2 ' designate alkyl radicals whose principal chain contains from 1 to 10 carbon atoms, the symbols F, Cl and Br which designate the fluorine, chlorine and the bromine bearing indices a, b, c, a', b', and c' representing the number of these atoms which are zero or positive whole numbers, such as m, n, p.

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Paris, France

Armand Eranian