Asml Netherlands B.v.

Other

Arjen Teake De Jong

Reinier Theodorus Martinus Jilisen

Andrey Alexandrovich Nikipelov

Kornelis Frits Feenstra

Nicolaas Antonius Allegondus Johannes Van Asten

Niek Antonius Jacobus Maria Kleemans

Robertus Wilhelmus Veltman

Harald Ernest Verbraak

Rolf Theodorus Nicolaas Beijsens

Pavel Seroglazov

Richard Vincent Armin De Jong

The present invention relates to an adjustable hearing protection device for arranging in and/or on the ear, the hearing protection device including: a housing with an acoustic entrance opening, an insertion part for inserting into an auditory canal of the ear extending from the housing with an acoustic exit opening oriented toward the interior of the auditory canal, and adjusting means for adjusting the hearing protection device to one of at least two acoustic adjustment positions. Each acoustic adjustment position sets one of a number of acoustic couplings between the entrance opening and the exit opening.

Adjustable hearing protection device

A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.

Radiation source having debris control

A radiation source, e.g. for EUV for use in a lithographic apparatus, generates radiation by illuminating droplets of fuel with first radiation to form a plasma and collects second radiation omitted by the plasma using a collector (CO). The collector has an aperture and the fuel passes along a vertical trajectory through that aperture before being irradiated by the first radiation. In an embodiment the first radiation is directed along a beam, the final part of which is coincident with the final part of the trajectory of the fuel droplets. In an embodiment a gas flow is arranged coincident with the fuel trajectory and/or the beam of first radiation.

Radiation source device, lithographic apparatus and device manufacturing method

Growing community of inventors

Barneveld, Netherlands

Arjen Teake De Jong