Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Arjen Boogaard

Timotheus Franciscus Sengers

Sjoerd Nicolaas Lambertus Donders

Hans Jansen

Wilhelmus Sebastianus Marcus Maria Ketelaars

Andreas Hubertus Montree

Carolus Ida Maria Antonius Spee

Jan Johannes Van Den Broek

Willem Reindert De Wild

Andrey Alexandrovich Nikipelov

Alexey Sergeevich Kuznetsov

Johannes Nicolaas Huiberts

Vadim Yevgenyevich Banine

Martinus Hermanus Wilhelmus Maria Van Delden

Andrei Mikhailovich Yakunin

Pieter-Jan Van Zwol

Coen Theodorus Hubertus Fransiscus Liedenbaum

Mária Péter

Jozef Petrus Henricus Benschop

Willem Joan Van Der Zande

Luigi Scaccabarozzi

Jeroen Huijbregtse

Maarten Van Kampen

Florian Didier Albin Dhalluin

Thimotheus Franciscus Sengers

Richard Antonius Fransiscus Van Der Rijt

Coen Theodorus Hubertus Franciscus Liedenbaum

Mária PÉTER

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

Lithographic apparatus and device manufacturing method

A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 10cm, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.

Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane

A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.

Radiation source-collector and method for manufacture

An extreme ultraviolet exposure apparatus includes a radiation system configured to supply a beam of extreme ultraviolet radiation; a support configured to support a patterning device, the patterning device configured to pattern the beam of extreme ultraviolet radiation according to a desired pattern; a substrate table having an area configured to support a substrate; a projection system configured to project the patterned beam of extreme ultraviolet radiation onto a target portion of the substrate, the projection system comprising a reflective optical system; wherein at least a part of the apparatus that during use of the apparatus is exposed to the beam of extreme ultraviolet radiation is coated with a coating, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.

Exposure apparatus

An exposure apparatus includes a radiation system configured to supply a projection beam of radiation, and a patterning device configured to pattern the projection beam according to a desired pattern. The apparatus includes a substrate table having an area configured to support a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. At least a part of the apparatus that during use of the apparatus is exposed to radiation is coated with a coating. The coating includes a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.

A digital camera has a memory and a scan-mode. In this mode, the camera takes a sequence of still pictures. A next one of the pictures in the sequence is selected for being stored in the memory based on an amount of overlap regarding a picture content with a previous one of the pictures stored in the memory. The camera processes the pictures stored in the memory so as to create a composite picture.

Digital camera with panorama or mosaic functionality

A coating for sensors and/or parts of an exposure apparatus, for example a sensor on a substrate table of a lithography apparatus, include a semiconductor, a photocatalyst, and/or a metal oxide.

Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby

The electronic device ( ) has a layer ( ) of a material comprising a first and a second element. This material has an amorphous and a crystalline state. A transition from the amorphous to the crystalline state can be effected by heating of the material to above a crystallization temperature, for example with a laser. As a result, the layer ( ) has a first electrically conducting areas ( ), comprising the material in the crystalline state, which are insulated from each other by the first electrically insulating area ( ), comprising the material in the amorphous state. The layer ( ) may be present as an interconnect layer, but also as a covering layer. Preferably, the material is aluminum-germanium. In the method of patterning a layer ( ), electrically conductive areas of the layer can be strengthened by electroplating.

Electronic device, and method of patterning a first layer

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Deventer, Netherlands

Arjen Boogaard