Asml Netherlands B.v.

Arjan Hubrecht Josef Anna Martens

Pieter Jacob Kramer

Anthonie Kuijper

Hans Jansen

Frank Johannes Jacobus Van Boxtel

Antonius Johannus Van Der Net

Martinus Hendrikus Antonius Leenders

Roelof Frederik De Graaf

Martinus Cornelis Maria Verhagen

Richard Joseph Bruls

Bauke Jansen

Kornelis Tijmen Hoekerd

Jeroen Gerard Gosen

Jean-Philippe Xavier Van Damme

Justin Johannes Hermanus Gerritzen

Sandra Van Der Graaf

Hubertus Leonardus Franciscus Heusschen

Eric Willem Felix Casimiri

Leonarda Hendrika Van Den Heuvel

Marc Léon Van Der Gaag

Peter Schoenmakers

Franciscus Joannes Anthonius Evers

Jaap Wilhelmus Petrus Van Empel

Léon Hubert Joseph Coumans

Alexandre Viktorovych Padiy

An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.

Pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method

A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.

Lithographic apparatus and device manufacturing method

A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.

Lithographic apparatus and a method of operating the apparatus

A temperature sensor is provided to measure the temperature of immersion liquid at a position where the immersion liquid is supplied. The reading of this temperature sensor is used to control the magnitude of heat input to the immersion liquid using a heater and/or cooler. A controller is used to calculate the calibration error of the temperature sensor relative to a temperature sensor that is provided upstream. The controller uses readings of the temperature difference between the two temperature sensors at one or more mass flow rates in order to estimate the temperature difference between the two temperature sensors at an infinite mass flow rate. The temperature difference at this infinite mass flow rate is estimated to be the temperature calibration error of the temperature sensor to measure the temperature of immersion liquid at a position where the immersion liquid is supplied relative to the upstream temperature sensor.

A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

Fluid temperature control and sensor calibration is disclosed. In an embodiment, a fluid temperature control unit includes a heater configured to heat a first fluid in a first fluid path, a first temperature sensor configured to measure a temperature of the first fluid in the first fluid path, a second temperature sensor configured to measure a temperature of a second fluid in a second fluid path, and a controller configured to control the heater on the basis of the temperature sensed by the first sensor and the temperature sensed by the second sensor.

Growing community of inventors

Valkenburg, Netherlands

Arjan Hubrecht Josef Anna Martens