Asml Netherlands B.v.

Arjan Gijsbertsen

Andrey Valerievich Rogachevskiy

Bastiaan Andreas Wilhelmus Hubertus Knarren

Norbertus Josephus Martinus Van Den Nieuwelaar

Bart Peter Bert Segers

Petrus Franciscus Van Gils

Thomas Augustus Mattaar

Willem Richard Pongers

Martin Jules Marie-Emile De Nivelle

Krijn Frederik Bustraan

Hubertus Antonius Geraets

Pieter Jacob Heres

Natalia Viktorovna Davydova

Doru Cristian Torumba

Ibrahim Acan

Jan Arie Den Boer

Cristina Caresio

Raymund Centeno

Tabitha Wangari Kinyanjui

Özer Duman

Rudolf Michiel Hermans

Erik Jansen

István Nagy

Viktor Trogrlic

Paul Van Dongen

A method of determining a mark measurement sequence for an object comprising a plurality of marks, the method including: receiving location data for the plurality of marks that are to be measured; obtaining a boundary model of a positioning device used for performing the mark measurement sequence; and determining the mark measurement sequence based on the location data and the boundary model.

Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus

A substrate holder to hold a substrate in a substrate holding position, the substrate holder including: a frame, multiple surface clamping devices arranged on the frame to clamp a substrate at an upper surface thereof, wherein the surface clamping devices each have a clamping pad to be arranged on the upper surface of the substrate, the surface clamping pads being movable with respect to each other at least in a first direction substantially perpendicular to the upper surface of a substrate held by the surface clamping pads, and one or more actuators to move the surface clamping pads with respect to each other in the first direction.

Substrate holder, carrier system comprising a substrate holder and lithographic apparatus

The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map from the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.

Height measurement method and height measurement system

An apparatus for measuring a height of a substrate for processing in a lithographic apparatus is disclosed. The apparatus comprises a first sensor for sensing a height of the substrate over a first area. The apparatus also comprises a second sensor for sensing a height of the substrate over a second area. The apparatus further comprises a processor adapted to normalize first data corresponding to a signal from the first sensor with a second sensor footprint to produce a first normalized height data, and to normalize second data corresponding to a signal from the second sensor with a first sensor footprint to produce a second normalized height data. The processor is adapted to determine a correction to a measured height of the substrate based on a difference between the first and second normalized height data.

Apparatus and method for measuring substrate height

A lithographic apparatus comprising a support structure constructed to support a patterning device, the patterning device being capable of imparting an EUV radiation beam with a grating in its cross-section to form a patterned EUV radiation beam, and a projection system configured to project the patterned EUV radiation beam onto a target portion of the substrate, wherein the support structure is provided with a grating comprising a series of first reflective portions which alternates with a series of second reflective portions, the second reflective portions having a reflectivity which is less than the reflectivity of at least part of the first reflective portions and which is greater than zero.

Lithographic apparatus and method

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Vucht, Netherlands

Arjan Gijsbertsen