Koninklijke Philips Corporation N.v.

Asml Netherlands B.v.

Nxp B.v.

Adeia Semiconductor Bonding Technologies Inc.

Arjan Franklin Bakker

Erik Roelof Loopstra

Johan Cornelis Compter

Angelo Cesar Peter De Klerk

Fransicus Mathijs Jacobs

Joep Stokkermans

Thomas Markus Kampschreur

Piet Van Der Meer

Harmen Klaas Van Der Schoot

Sven Antoin Johan Hol

Jan Van Eijk

Marcel Koenraad Marie Baggen

Krijn Frederik Bustraan

Thomas Petrus Hendricus Warmerdam

Hubert Gerard Jean Joseph Amaury Vroomen

Funda Sahin Nomaler

Piet Christiaan Jozef Van Rens

Dennis Erwin Bos

Mark Scholten

Arjan Martin Van Der Wel

Franciscus Martinus Roes

Piet C J Van Rens

Arnoldus J C B De Vet

Arnoldus Jacobus Cornelis Bernardus De Vet

Anthonius Johannes Dirk Verdel

The present invention relates to a rotating ring apparatus comprising: &#x2014;a stationary ring (), &#x2014;a rotating ring () for rotation around a central region (), &#x2014;a rotation unit () for radially bearing and rotating said rotating ring () with respect to the stationery ring (), said rotation unit including a stationary induction element () mounted on said stationery ring () and a rotating induction element () mounted on said rotating ring (), and &#x2014;a controller () for controlling said rotation unit () to rotate and levitate the rotating induction element ().

Rotating ring apparatus

A method and apparatus are discloses for wirebonding leads of a plurality of lead frames being part of a lead frame assembly by a wirebonding tool to semiconductor products mounted on the respective lead frames. The semiconductor products are clamped by a clamping mechanism comprising a stationary clamp and a movable clamp. The movable clamp follows the indexing movement of the lead frame assembly during wirebonding of the semiconductor products clamped by the movable clamp. The wirebonding process does not need to be interrupted for the indexing.

Wirebonding method and apparatus

A system for positioning a product, comprising a chuck for supporting the product, an intermediate stage supporting said chuck, and a stationary base supporting said intermediate stage. The chuck can move with respect to the intermediate stage in a first direction X, and the intermediate stage can move with respect to said stationary base in a second direction Y. The system furthermore comprises at least one laser interferometer for measuring the position of the chuck relative to the stationary base. The main part of the laser interferometer is attached to the intermediate stage, so that it can measure the distance between a reflector on the chuck and a reflector on the stationary base.

System and method for positioning a product using a laser interferometer

A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.

Lithographic apparatus and stage apparatus

A motor includes a magnet assembly to generate a magnetic field. The field includes along the first direction parts which are alternately orientated in the first and the second direction. The parts extend in a third direction which is perpendicular to the first and the second direction. The motor further includes a first coil winding to carry a first current. The first coil winding to extend in the first direction between parts of the magnetic field orientated in the second direction, to generate the force in the first direction. The motor also includes a second coil winding to carry a second current. The second coil winding to extend in the first direction between parts of the magnetic field substantially orientated in the first direction, to generate the force in the second direction.

Lithographic apparatus and motor

A apparatus processes an object (), such as a semi-conductor wafer at accurately controlled positions. The object () is supported by a working platform () that is moveable along a path. A suspension actuator part () attached to the working platform (), contains a soft magnetic core () with poles facing the surface of a soft magnetic element () on the support structure along the path and a winding () for application of a current to generate a magnetic field that runs through the core () v the poles and returns via the soft magnetic element (). A sensor () senses a measured position of the suspension actuator part () relative to the position reference element (). A control circuit comprises an outer control circuit () and an inner control circuit (). The outer control circuit () receives a sensing result and determines force set point information to regulate the measured position of the actuator part () to a required value. The inner control circuit () receives the force set point information and controls the current to realize a force between the actuator part () and the support structure () according to the force set point information.

Apparatus for processing an object with high position accurancy

Growing community of inventors

Helenaveen, Netherlands

Arjan Franklin Bakker