Az Electronic Materials USA Corp.

Merck Patent Gmbh

Clariant International Ltd

Az Electronic Materials (luxembourg) S.a.r.l.

Aritaka Hishida

Hengpeng Wu

Weihong Liu

Shuji Sue Ding-Lee

Mark O Neisser

Joseph E Oberlander

PingHung Lu

Chunwei Chen

SookMee Lai

Medhat E Toukhy

Yoshiharu Sakurai

Ping-Hung Lu

Jianhui Shan

Georg Pawlowski

Medhat A Toukhy

Hong Zhuang

Zhong Xiang

Yoshiaki Kinoshita

Yuko Yamaguchi

Wenbing Kang

Hiroshi Okazaki

Yu Sui

Naoko Tsugama

Xiao-Ming Ma

Lei Lu

Hisashi Motobayashi

Pinghung Lu

A negative working, aqueous base developable, photosensitive photoresist composition and a process of using this composition to produce lithographic images, where this composition is one comprising: a) a polymer containing the four repeat units of structures (1), (2), (3), and (4), but no other types of repeat units; wherein v, x, y and z, respectively, represent the mole % of each repeat units of structures (1), (2), (3) and (4); b) a radical photo-initiator component, which is comprised of at least one radical photo initiator which is activated by a broad absorption of radiation from about 360 nm to about 440 nm; c) a crosslinker component which is either a mixture consisting of crosslinkers of structure (5), (6) and (7), or a single crosslinker of structure (8); d) a radical inhibitor component; e) an optional surfactant component; f) an optional dissolution promoter component; and g) a solvent. The invention also relates to the process of using this negative resist to produce lithographic images.

Negative-working ultra thick film photoresist

The present application for patent relates to a light-sensitive positive working photosensitive composition especially useful for imaging thick films using a composition which gives very good film uniformity and promotes a good process latitude against feature pattern collapse in patterns created upon imaging and developing of these films.

Positive working photosensitive material

Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.

The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Positive-working photoimageable bottom antireflective coating

The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

Antireflective compositions for photoresists

Radiation-sensitive composition of chemical amplification type

Growing community of inventors

Bedminster, NJ, United States of America

Aritaka Hishida