Asml Holding N.v.

Veeco Instruments Inc.

Asml Netherlands B.v.

Arindam Sinharoy

Stephen Roux

Peter Conrad Kochersperger

Christopher Charles Ward

Eric Armour

Robert Gabriël Maria Lansbergen

Daniel Nathan Burbank

Leo A Chin

Mark Josef Schuster

Christopher J Morath

Jean-Philippe Xavier Van Damme

George Hilary Harrold

David Ramirez

Raymond C Logue

Don Sirota

Duncan Harris

Xugang Xiong

Chi-Jung Cheng

Christopher A Morath

Ray Logue

Karthik Karkala

A chemical vapor deposition or atomic layer deposition system includes a gas concentration sensor for determining the quantity of precursor gases admitted thereto. The gas concentration sensor can include a transmitter and a receiver for transmitting an acoustic signal across a chamber. In embodiments, the transmitter and receiver are designed to increase transmitted signal while reducing transmitted noise, facilitating use of the gas concentration sensor at low pressure and high temperature.

Gas concentration sensors and systems

Mass-transfer rate control arrangement and method in which a process precursor mixture is produced containing carrier gas and a process precursor gas. A quantity of the process precursor present in the process precursor mixture is acoustically sensed to produce a sensor output. A dilution gas is provided and the process precursor mixture and the dilution gas are separately conveyed to a dilution point, at which a diluted mixture of the dilution gas and the process precursor mixture is achieved. A relative flow rate of the carrier gas and the dilution gas is automatically controlled in response to the sensor output such that the diluted mixture at the dilution point has a prescribed mass transfer rate of the precursor gas.

Enhanced enclosures for acoustical gas concentration sensing and flow control

A patterning device support (), for example, a patterning device () or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface () or an acoustic vibration generating interface (), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

Patterning device support and lithographic apparatus

An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.

Lithographic apparatus and device manufacturing method

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Furlong, PA, United States of America

Arindam Sinharoy