Carl Zeiss Smt Gmbh

Kuka Roboter Gmbh

Carl-Zeiss-Smt Ag

Actuator Solutions Gmbh

Kuka Laboratories Gmbh

Arif Kazi

Jochen Weber

Markus Hauf

Sascha Bleidistel

Payam Tayebati

Toralf Gruner

Olaf Conradi

Ulrich Schoenhoff

Rainer Bischoff

Baerbel Schwaer

Alexander Sauerhoefer

Michael Thier

Ole Fluegge

Gerhard Focht

Hubert Holderer

Boris Bittner

Eric Eva

Wolfgang Hummel

Wolfgang Singer

Alexander Epple

Aurelian Dodoc

Heiko Feldmann

Norbert Wabra

Aksel Goehnermeier

Susanne Beder

Helmut Beierl

Dirk Hellweg

Gerhard Hietmann

Markus Köpfer

Olaf Rogalsky

Tilmann Heil

Jens Bunsendal

Neven Bobic

Markus Bäuml

Carsten Spieβ

Bahadir Kuepeli

Michael Honold

Carsten Spiess

Multi-stable SMA actuator comprising two shape memory alloy wires () in antagonistic configuration that allow to define multiple stable positions of a movable element (), said positions being maintained by movable stoppers to lock the movable element, that do not require power and are disengaged by the shape memory alloy wires () upon actuation thereof.

Multi-stable actuator based on shape memory alloy wires

The disclosure relates to an optical correction arrangement including at least one optical element and at least one irradiation mechanism for the targeted local irradiation of the optical element with electromagnetic heating radiation for the targeted local heating of the optical element. The optical correction arrangement also includes a mechanism for dissipating the thermal energy introduced into the optical element by the at least one irradiation mechanism. The disclosure furthermore relates to a projection exposure apparatus for semiconductor lithography including an optical correction arrangement according to the disclosure.

Semiconductor microlithography projection exposure apparatus

A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

Projection lens system of a microlithographic projection exposure installation

A method for overlaying AR objects on an environmental image representing the environment includes recording a depth image of the environment from a point of vision; modifying the representation of an AR object to be placed in the environmental image in terms of how it appears from the point of vision at a pre-defined spot in the environmental image; determining how the parts of the AR object facing the point of vision are arranged in relation to an associated image point of the depth image, from the point of vision; modifying at least the representation of parts of the AR object in a pre-determined manner in relation to the apparent depth in the image; and overlaying the processed AR object on the environmental image. A device for overlaying AR objects on an environmental image displaying the environment operates according to the method steps.

Method and device for determining optical overlaps with AR objects

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Optical element and method

A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.

Microlithographic projection exposure apparatus with correction optical system that heats projection objective element

The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.

Optical correction device

A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Projection objective of a microlithographic projection exposure apparatus

A process and a device are provided for determining the pose as the entirety of the position and the orientation of an image reception device. The process is characterized in that the pose of the image reception device is determined with the use of at least one measuring device that is part of a robot. The device is characterized by a robot with an integrated measuring device that is part of the robot for determining the pose of the image reception device.

Process and device for determining the position and the orientation of an image reception means

A method and a system for controlling a plurality of manipulators with a large number of control units associated with the manipulators in such a way that each control unit controls at least one manipulator, are characterized in that an operating device accesses several control units for controlling the manipulators. Thus, it is possible according to the invention to operate even very closely juxtaposed manipulators without any crossing and interlacing of the connecting channels between the operating devices and control units which would prevent a reliable association in operation. The invention also makes it possible for only one operator to operate cooperating robots.

Method and device for controlling a plurality of manipulators

To improve the operation of robots in installations reprogramming and emptying an operating sequence to be performed by them, the invention provides a method and a device for visualizing computer-assisted information in an image of the real environment on a viewing device, in which there is a determination of the position and orientation or pose of the image receiving device and that robot-specific informations corresponding to this determination are faded over the image of the real environment on the viewing device.

Method and device for visualizing computer-generated informations

Growing community of inventors

Aalen, Germany

Arif Kazi