Nano Green Technology, Inc.

Silicon Genesis Corporation

Ariel Flat

Suraj Puri

Igor J Malik

Michael I Current

Sien G Kang

Harry Robert Kirk

Philip James Ong

Martin Fuerfanger

A process for evaluating a cleaning solution is described. The process includes: (a) subjecting a solution, including a solute and a solvent, to sonic energy to create a sonicated solution; (b) measuring UV absorption of the sonicated solution to produce a sample UV absorbance spectra; (c) obtaining a reference UV absorbance spectra; (d) scaling the reference UV absorbance spectra to the sample UV absorbance spectra at a lower range of the UV spectrum; (e) subtracting from the reference UV absorbance spectra the sample UV absorbance spectra to produce a differential UV spectra; and (f) evaluating at or near a peak of the sample UV absorbance spectra the differential UV absorbance spectra to determine whether the sonicated solution is activated.

Evaluating a cleaning solution using UV absorbance

The present invention provides for treating a surface of a semiconductor material. The method comprises exposing the surface of the semiconductor material to a halogen etchant in a hydrogen environment at an elevated temperature. The method controls the surface roughness of the semiconductor material. The method also has the unexpected benefit of reducing dislocations in the semiconductor material.

Non-contact etch annealing of strained layers

A process for evaluating a cleaning solution is described. The process includes: (i) subjecting a solution, including a solute and a solvent, to sonic energy to create a sonicated solution; (ii) measuring UV absorption of the sonicated solution to produce a sample UV absorbance spectra; (iii) obtaining a reference solution, which includes a solute concentration that is similar to that of solute concentration in the sonicated solution; (iv) measuring UV absorption of the reference solution to produce a reference UV absorbance spectra; (v) scaling the reference UV absorbance spectra to the sample UV absorbance spectra at a lower range of the UV spectrum; (vi) subtracting from the reference UV absorbance spectra the sample UV absorbance spectra to produce a differential UV spectra; and (vii) evaluating at or near a peak of the sample UV absorbance spectra the differential UV absorbance spectra to determine whether the sonicated solution is activated.

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Palo Alto, CA, United States of America

Ariel Flat