Asml Netherlands B.v.

Carl-zeiss-stiftung Trading As Carl Zeiss

Arie Cornelis Scheiberlich

Hubert Holderer

Andre Bernardus Jeunink

Christian Wagner

Michael Gerhard

Siegfried Alexander Tromp

Yuri Johannes Gabriël Van De Vijver

Thomas Poiesz

Abraham Alexander Soethoudt

Youssef Karel Maria De Vos

Jochen Becker

Coen Hubertus Matheus Baltis

Erich Merz

Bert Dirk Scholten

André Schreuder

Justin Johannes Hermanus Gerritzen

Menno Fien

Erwin Gaber

Evelyn Wallis Pacitti

Ringo Petrus Cornelis Van Dorst

Jelmer Mattheüs Kamminga

Evert H J Draaijer

Gerhard Albert Ten Brinke

Robby Franciscus Josephus Martens

Dirk Jerome Andre Senden

A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Lithographic apparatus, method for unloading a substrate and method for loading a substrate

On-the-Fly leveling in a lithographic apparatus is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor (LVDT or IFM). The level sensor may include look-ahead. The filter may be a low pass filter to cut-off level variations of wavelength shorter than the width of the slit during a scanning exposure. The filter may also be selected to reduce cross-talk between tilt movements and horizontal displacements.

Lithographic apparatus, device manufacturing method, and device manufactured thereby

An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount ( ), and actuators ( ) which engage on the optical element ( ) at least approximately perpendicularly to the optical axis. The actuators ( ) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element ( ), for the production of bendings which take place substantially without thickness changes.

Optical system, especially a projection light facility for microlithography

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Veldhoven, Netherlands

Arie Cornelis Scheiberlich