Braggone Oy

Optitune Oy

Basf Se Corporation

Az Electronic Materials USA Corp.

Optitune Plc

Optitune Public Limited Company

Ari Kärkkäinen

Milja Hannu-Kuure

Admir Hadzic

Jarkko Leivo

Rauna-Leena Kuvaja

Henna Järvitalo

Graeme Gordon

Neil Gregory Pschirer

Matti Pesonen

Sami Pirinen

Ralph R Dammel

Mark O Neisser

Toshikage Asakura

Hiroshi Yamamoto

David J Abdallah

PingHung Lu

Ruzhi Zhang

Sacha Legrand

WooKyu Kim

Hsin Tsao Tang

Paul Williams

Ying Jung Chen

Oskari Maekimartti

Jianhui Wang

Tiina Leppäjärvi

Mi Zhou

Henna Jaervitalo

Amir Hadzic

A layered structure comprising a substrate layer; and a layer of a siloxane polymer on the substrate layer, the layered structure being capable of being bent about a mandrel having a radius of curvature without breaking. The layer of the siloxane polymer has a thickness of 1 to 50 μm, in particular about 5 to 20 μm, and it is obtained by depositing on the substrate a composition comprising at least three different silane monomers, including at least one bi-silane; at least one of the silane monomers having an active group capable of achieving cross-linking to adjacent siloxane polymer; at least partially hydrolyzing the silane monomers to form siloxane polymer chains; and cross-linking the siloxane polymer chains so as to achieve a cross-linked siloxane polymer layer on the substrate.

Flexible and foldable abrasion resistant photopatternable siloxane hard coat

The present invention relates to a process for preparing a thin film on a substrate comprising the steps of preparing two precursor compositions comprising metalloid compounds and combining them thereafter whereby one precursor composition is hydrolyzed prior to combination. The present invention is further related to a multilayer structure and an article comprising the thin film obtainable by the process, a composition comprising the precursor compositions, a kit-of-parts comprising the precursor compositions and the use of the composition and the kit-of-parts for preparing a thin film on a substrate.

Organomodified metal oxide or metalloid oxide polymer film

The present invention relates to a process for preparing a thin film on a substrate in which a first precursor composition (FPC) and a second precursor composition (SPC) are combined, a thin layer of the combined first precursor composition (FPC) and second precursor composition (SPC) is formed on a substrate and the thin layer is cured, an article comprising said thin layer, a composition comprising said first precursor composition (FPC) and said second precursor composition (SPC), a kit-of-parts comprising said first precursor composition (FPC) and said second precursor composition (SPC) in two vessels and the use of said composition or kit-of-parts for preparing a thin film on a substrate and for preparing an optical or electrical coating.

Easy to clean coating

The present invention provides a method for covering a substrate, and includes the following operations: (a) admixing at least four different silane monomers and at least one bi-silane to a first solvent(s) to form a mixture, with the proviso that at least one of the silane monomers or the bi-silane comprises an active group capable of achieving cross-linking to adjacent siloxane polymer chains of the siloxane polymer composition; (b) subjecting the mixture to an acid treatment so that the silane monomers are at least partially hydrolysed, and the hydrolysed silane monomers, the silane monomers and the bi-silane are at least partially polymerized and cross-linked; (c) optionally changing the first solvent to a second solvent; and (d) subjecting the mixture to further cross-linking of the siloxane polymer to achieve a predetermined degree of cross-linking, depositing the siloxane polymer composition on the substrate, and optionally curing the deposited siloxane polymer composition.

Siloxane polymer compositions and their use

A method of producing a photovoltaic cell having a cover, comprising the steps of: providing a photovoltaic cell which comprises a crystalline silicon substrate; providing a transparent substrate; forming an antireflective coating on said transparent substrate to provide a coated transparent substrate; and covering the photovoltaic cell with said coated transparent substrate. The antireflective coating is a hybrid organic-inorganic material having an inorganic portion comprising silicon, oxygen and carbon, and further comprising an organic portion with organic groups connected to the inorganic portion. Methods of producing solar panels, coated glass substrates as well as antireflection coatings are disclosed as well as novel compositions of hybrid organic-inorganic materials.

Carbosiloxane polymer compositions, methods of producing the same and the use thereof

A computer or personal communication device or a similar device, comprising a CPU; and a display; wherein the display comprises; an array of optical elements; a touch sensor; and a glass cover having a coating that is oleophobic. The coating of the glass is a polymer having silicon, oxygen and carbon in the backbone. Optionally it may comprise fluorine. The coating has a water contact angle of 65 or more, an oil contact angle of 20 degrees or more, and a pencil hardness of 7H or more. Thus, the coating combines properties of hydro-and oleophobicity and hardness.

Scratch resistant, easy-to-clean coatings, methods of producing the same and the use thereof

The invention is based on the idea of providing a light emitting diode (OLED) device which contains a substrate with a photonic crystal, whereby the formed film structure induces enhancement of the liberation of photons trapped inside the light emitting device structure. The photonic crystal structure is a film structure on a substrate produced using a combination of high and low refractive index materials, at least one of the materials being based on a liquid phase deposited metal-oxide or metalloid oxide material. By means of the invention light trapped due to total internal reflection in a waveguide acting light emitting structure can be extracted efficiently from the device by introducing the photonic crystal device structure between the substrate and conductive anode layer.

Method of making a photonic crystal device and photonic crystal device

A method of passivating a silicon substrate for use in a photovoltaic device, comprising providing a silicon substrate having a bulk and exhibiting a front surface and a rear surface, and forming by liquid phase application a dielectric layer on at least said rear surface. The dielectric layer formed at the rear surface is capable of acting as a reflector to enhance reflection of light into the bulk of the silicon substrate, and the dielectric layer is capable of releasing hydrogen into the bulk as well as onto a surface of the silicon substrate in order to provide hydrogenation and passivation. The present invention provides an inexpensive, low cost method of improving the electrical and/or optical performance of photovoltaic devices through the application of coating chemicals onto the backside of the silicon substrate.

Method of passivating a silicon substrate for use in a photovoltaic device

An organic-inorganic composition, which has a backbone containing &#x2014;Si&#x2014;O&#x2014; units with chromophore groups attached directly to at least a part of the silicon atoms. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned and a desired Si-content of the anti-reflective coating composition can be obtained&#x2014;a high Si-content will give good mechanical and thermal properties and also the required wet etch and dry etch properties.

Hybrid inorganic-organic polymer compositions for anti-reflective coatings

A siloxane composition and a method of producing the same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution. Further, there are reactive functional groups, which are capable of reacting during thermal or radiation initiated curing. The siloxane is cross-linked during condensation polymerization to increase molecular weight thereof. The composition can be used in high-resolution negative tone lithographic fabrication processes where a water based developer system is applied in the development step of the lithography process.

Siloxane polymer compositions

A silicon polymer material, which has a silicon polymer backbone with chromophore groups attached directly to at least a part of the silicon atoms, the polymer further exhibiting carbosilane bonds. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned. By varying the proportion of carbosilane bonds, and a desired Si-content of the anti-reflective coating composition can be obtained.

Carbosilane polymer compositions for anti-reflective coatings

Process for producing an organosiloxane polymer and novel organosiloxane polymer compositions. The process according to the invention comprises hydrolyzing tetraalkoxysilane monomers in a hydrolysis step; and polymerising said hydrolyzed monomers in a polymerization step by subjecting them to conditions conducive to polymerisation to form an organosiloxane polymer. The hydrolysis step is conducted in a reaction medium comprising an organic compound with hydroxy groups. The invention allows for the synthesis of siloxane polymer compositions suitable for thin-film applications using a high content of tetra- and trifunctional silixane polymer precursors.

Organosiloxane polymer compositions

The present invention relates to metal oxide coating materials that can be used as thin film thin film coatings on various substrate surfaces. The invention also concerns a method of making metal oxide material which are stable in aqueous phase and that can be deposited on a substrate by liquid phase deposition, such as spin-on deposition. The new materials can be patterned lithographically or non-lithographically and are applicable for building up various electronic and opto-electronic device structures, such as anti-reflection layers, high-k interlayer and gate oxide structures for ICs, etch stop layer, CMP stop layer, solar cells, OLEDs packaging, optical thin film filters, optical diffractive grating applications and hybrid thin film diffractive grating structures.

Growing community of inventors

Oulu, Finland

Ari Kärkkäinen