Applied Materials, Inc.

Trupik, Inc.

Aravind Inumpudi

Thomas L Laidig

Sridhar Tirumala

Vikranth Katpally Reddy

David Joseph Harmon

Shivani Pulimamidi

Embodiments described herein relate to a system, software, and a method of using the system to edit a design to be printed by a lithography system. The system and methods utilize a server of a maskless lithography device. The server includes a memory. The memory includes a virtual mask file. The virtual mask file includes cells and the cells include sub-cells that form one or more polygons. The server further includes a controller coupled to the memory. The controller is configured to receive a replacement table. The replacement table includes instructions to replace the cells of the virtual mask file. The controller is further configured to replace the cells with replacement cells according to the replacement table to create an edited virtual mask file.

Use of adaptive replacement maps in digital lithography for local cell replacement

Exemplary embodiments described herein relate to systems and methods for generating an image comprising a three-dimensional ('3D') model or replica of a subject. Such images may include the face of a human subject as well as views of the subject from various angles.

Systems and methods for image generation and modeling of complex three-dimensional objects

Embodiments of the present disclosure can be used to generate an image replica of a person wearing various outfits to help the person visualize how clothes and accessories will look without actually having to try them on. Images can be generated from various angles to provide the person an experience as close as possible to actually wearing the clothes, accessories and looking at themselves in the mirror. Among other things, embodiments of the present disclosure can help remove much of the current uncertainty involved in buying clothing and accessories online.

Growing community of inventors

Fremont, CA, United States of America

Aravind Inumpudi