Tdk Corporation

Arata Sato

Takashi Fukui

Akira Sato

Kaname Ueda

Shintaro Kon

A method of production of a multilayer ceramic electronic device having dielectric layers with an interlayer thickness of 5 &#x3bc;m or less and internal electrode layers including a base metal, including the steps of firing, then annealing a stack comprised of a dielectric layer paste and an internal electrode layer paste including a base metal alternately arranged in 100 layers or more under a reducing atmosphere, treating the annealed stack by first heat treatment under a strong reducing atmosphere of an oxygen partial pressure Pof over 2.9&#xd7;10Pa to less than 6.7&#xd7;10Pa at a holding temperature Tof over 300&#xb0; C. to less than 600&#xb0; C. The stack after the first heat treatment is treated by second heat treatment under an atmosphere of an oxygen partial pressure Pof over 1.9&#xd7;10Pa to less than 4.1&#xd7;10Pa at a holding temperature Tof over 500&#xb0; C. to less than 1000&#xb0; C.

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Chuo-ku, Japan

Arata Sato