Monterey Design Systems, Inc.

Mentor Graphics Corporation

Ara Markosian

Yaacov (Jacob) Greidinger

Stephen Paul Sample

Jonathan Frankle

Valeriy K Sukharev

Siu-Tong Hui

Jon Frankle

Yaacov I Greidinger

Sedrak Sargisian

David S Reed

Hasmik Lazaryan

A method for determining an effect of via/contact pattern density in via/contact etch rate of a wafer includes determining a neutral etchant species number flux intersecting each via/contact mouth as a function of local layout characteristics and determining variations in the neutral etchant species flux number as a function of the via/contact pattern density in a wafer scale. The comparison of these number fluxes provides the capability to discriminate an underetched or an overetched via/contact from normal vias/contacts satisfying an etch tolerance criterion. Chip designers can modify the layout design to minimize via/contact failures. Chip manufacturers can modify the etching process to minimize via/contact failures.

Method for determining via/contact pattern density effect in via/contact etch rate

An automated method of designing large digital integrated circuits using a software program to partition the design into physically realizable blocks and then create the connections between blocks so as to maximize operating speed and routability while minimizing the area of the resulting integrated circuit. Timing and physical constraints are generated for each physically realizable block so that standard-cell place and route software can create each block independently as if it were a separate integrated circuit.

Method for designing large standard-cell base integrated circuits

An electronic computer aided design system provides for automated operation of a plurality of design tools to produce multiply design solutions to an initial circuit layout. Through the user entry of relative weights for: power, timing and area, different solutions to an initial layout can be generated exhibiting the requested balance of improvements over the original layout. A novel parts placement process is disclosed which prioritizes the reconfiguration of the initial design in a manner which assures that the multiple solutions will be generated which exhibit improved performance over the original layout in accordance with the priorities established by the user.

Method and apparatus for providing multiple electronic design solutions

A system is disclosed for compacting an initial electronic layout of cells within an initial layout boundary. The system includes forming paths extending from a bottom edge of the layout to a top edge. The paths intersect cells of the initial layout. The system determines which of the paths are critical paths. Critical cuts are then determined. A critical cut is a cut that severs critical paths. A set of cells associated with a critical cut are removed from the layout and replaced in order to reduce the initial layout boundary.

Method and apparatus for optimizing electronic design

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Cupertino, CA, United States of America

Ara Markosian