Asml Netherlands B.v.

Asml Holding N.v.

Antonius Johannus Van Der Net

Jeroen Johannes Sophia Maria Mertens

Patricius Aloysius Jacobus Tinnemans

Martinus Cornelis Maria Verhagen

Jacobus Johannus Leonardus Hendricus Verspay

Johannes Henricus Wilhelmus Jacobs

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Nicolaas Ten Kate

Joost Jeroen Ottens

Michel Riepen

Marco Koert Stavenga

Roelof Frederik De Graaf

Franciscus Johannes Joseph Janssen

Theodorus Petrus Maria Cadee

Boris Menchtchikov

Johannes Anna Quaedackers

Herman Boom

Frederik Eduard De Jong

Stoyan Nihtianov

Christianus Gerardus Maria De Mol

Richard Moerman

Marcel Johannus Elisabeth Hubertus Muitjens

Koen Goorman

Martin Frans Pierre Smeets

Bart Leonard Peter Schoondermark

Hans Jansen

Franciscus Johannes Herman Maria Teunissen

Maria Elisabeth Reuhman-Huisken

Martinus Hendrikus Antonius Leenders

Teunis Cornelis Van Den Dool

Aschwin Lodewijk Hendricus Johannes Van Meer

Anthonie Kuijper

Anthonius Martinus Cornelis Petrus De Jong

Jacques Cor Johan Van Der Donck

Edwin Augustinus Matheus Van Gompel

Pieter Jacob Kramer

Peter Franciscus Wanten

Jan Willem Cromwijk

Nadja Schuh

Robert Douglas Watso

Edwin Van Gompel

Aschwin Lodewijk Hendricus Johannes Vermeer

Frank Johannes Jacobus Van Boxtel

Arjan Hubrecht Josef Anna Martens

Erik Henricus Egidius Catharina Eummelen

Richard Joseph Bruls

Bauke Jansen

Kornelis Tijmen Hoekerd

Daniel Jozef Maria Direcks

Jeroen Gerard Gosen

Bart Dinand Paarhuis

Gerardus Arnoldus Hendricus Franciscus Janssen

Sandra Van Der Graaf

Nicholas Peter Waterson

Sven Pekelder

Joost André Klugkist

Roelof Frederick De Graaf

Jaap Oudes

Remco Van De Meerendonk

Eric Willem Felix Casimiri

Johannes Franciscus Martinus Van Santvoort

Leonarda Hendrika Van Den Heuvel

Jinggao Li

Franciscus Johaannes Herman Maria Teunissen

Jeroen Peterus Johannes Van Lipzig

Güneş Nakiboǧlu

Mana Elisabeth Reuhman-Huisken

Alexandre Viktorovych Padiy

Jacobus Johannus Leonardus Hendricus Verspaij

A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

Temperature conditioning system, a lithographic apparatus and a method of temperature conditioning an object

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.

Lithographic apparatus and method of cooling a component in a lithographic apparatus

An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Lithographic apparatus and contamination removal or prevention method

Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor

A humidifying apparatus is disclosed in which gas is provided to a first side of a membrane and liquid to a second side of the same membrane. The membrane is non-porous to the liquid but porous to vapor of the liquid and is liquidphilic to said liquid.

Humidifying apparatus, lithographic apparatus and humidifying method

A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.

Growing community of inventors

Tilburg, Netherlands

Antonius Johannus Van Der Net