Asml Netherlands B.v.

Amsl Netherlands B.v.

Antonius Johannes Josephus Van Dijsseldonk

Erik Roelof Loopstra

Jan Bernard Plechelmus Van Schoot

Dominicus Jacobus Petrus Adrianus Franken

Markus Franciscus Antonius Eurlings

Johannes Hubertus Josephina Moors

Marcel Mathijs Theodore Marie Dierichs

Hans Van Der Laan

Uwe Mickan

Vadim Yevgenyevich Banine

Arie Jeffrey Den Boef

Johannes Jacobus Matheus Baselmans

Martinus Hendrikus Antonius Leenders

Marc Wilhelmus Maria Van Der Wijst

Antoine Gaston Marie Kiers

Gerardus Hubertus Petrus Maria Swinkels

Mircea Dusa

Wilhelmus Josephus Box

Wilhelmus Petrus De Boeij

Robertus Johannes Marinus De Jongh

Harm-Jan Voorma

Josephus Jacobus Smits

Arno Jan Bleeker

Johannes Henricus Wilhelmus Jacobs

Levinus Pieter Bakker

Timotheus Franciscus Sengers

Hernes Jacobs

Andrei Mikhailovich Yakunin

Heine Melle Mulder

Paulus Martinus Maria Liebregts

Jozef Petrus Henricus Benschop

Jeroen Jonkers

Maurice Willem Jozef Etiënne Wijckmans

Hako Botma

Albrecht Hof

Oscar Franciscus Jozephus Noordman

Petrus Rutgerus Bartray

Christiaan Louis Valentin

Diederik Jan Maas

Marius Ravensbergen

Judocus Marie Dominicus Stoeldraijer

Martinus Arnoldus Henricus Terken

Robert Gordon Livesey

Bastiaan Stephanus Hendricus Jansen

Michael Jozefa Mathijs Renkens

Kevin Weimin Zhang

Niek Antonius Jacobus Maria Kleemans

Igor Petrus Maria Bouchoms

Ramon Mark Hofstra

Jacob Kleijn

Marcel Dierichs

Klaus Mehlkopp

Mustafa Amhaouch

Franciscus Catharina Bernardus Marinus Van Vroonhoven

Michael M&uuml;hlbeyer

Tien Nang Pham

Jiun-Cheng Wang

Rogier Herman Mathijs Groeneveld

Bastiaan S H Jansen

Marc Van Der Wijst

Jan Bruining

G&uuml;nter Maul

Oscar Fransiscus Jozephus Noordman

Erik Roeloff Loopstra

Jan Piechelmus Van Schoot

Josephus Jakobus Smits

A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Lithographic apparatus, spectral purity filter and device manufacturing method

A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5&#xd7; and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.

Lithographic method and apparatus

A faceted reflector (&#x2033;) for receiving an incident radiation beam () and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

Radiation source

A lithographic projection apparatus is provided with a EUV radiation system that includes a source chamber, a supply constructed and arranged to supply a target material to a predetermined plasma formation position, an optical system formed by three or more mirrors arranged to establish a beam path extending to the target material when the target material is located at the predetermined plasma formation position, and a laser system constructed and arranged to provide a laser beam along the beam path for interaction with the target material to produce an EUV radiation-emitting plasma inside the chamber.

EUV radiation system and lithographic apparatus

An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.

Lithographic apparatus and device manufacturing method

A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.

Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter

A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

A lithographic apparatus comprising a source that generates a beam of radiation, a support structure supporting a patterning device, a substrate table for holding a substrate, and a projection system projecting the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a vibration measurement apparatus configured to measure relative vibration between the patterning device and the substrate during exposure of the target portion. A control apparatus adjusts power of the radiation beam to compensate for the effect of the measured relative vibration on the pattern projected onto the substrate.

Lithographic apparatus and method

A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.

Lithographic projection apparatus and method of compensating perturbation factors

An optical apparatus is disclosed that has a convex mirror and a concave mirror with an aperture, wherein, in use, radiation from a radiation emitter passes through the aperture and is incident upon the convex mirror before being incident upon the concave mirror, the optical apparatus arranged to form the radiation into a radiation beam, wherein the concave mirror is translatable towards and away from the convex mirror or the convex mirror is translatable towards and away from the concave mirror, to adjust divergence of the radiation beam.

Optical apparatus

A method of fabricating a device using a lithographic process, the method comprising applying a layer of radiation sensitive resist on top of the device, applying a metallic layer on top of the resist layer, and exposing a part of the resist layer to radiation while coupling the metallic layer to a fixed potential so as to apply an electric field across the resist layer, the direction of the electric field being substantially perpendicular to the plane of the resist layer.

Device manufacturing method and apparatus with applied electric field

A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.

Lithographic apparatus

In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.

Test pattern, inspection method, and device manufacturing method

A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

A lithographic apparatus includes an illumination system configured to provide a beam of radiation and projection system configured to project the radiation beam onto a target portion of a substrate. At least one of the illumination system and the projection system includes a focusing element for reflecting or refracting the beam. A plurality of stop discs is provided, each having an aperture therethrough, together with a disc positioner configured to place one of the stop discs adjacent the focusing element to control the numerical aperture (NA) of the projection system or illumination system. The apparatus further includes a disc changer configured to select one of the stop discs and provide the selected stop disc to the disc positioner, the disc changer being external to the projection system or illumination system.

Growing community of inventors

Hapert, Netherlands

Antonius Johannes Josephus Van Dijsseldonk