Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Antonius Hubertus Joannes Gerardus Lommen

Andries Rijfers

Mark Herman Else Vaes

Adrianus Johannes Petrus Maria Vermeer

Herman Hendrikus Maalderink

Gerardus Johannes Nicolaas Doodeman

Jacobus Hubertus Theodoor Jamar

Hubregt Jannis Visser

Helena De Voogd-Claessen

The present invention relates to an illumination system for use in a stereolithography apparatus. The illumination system includes a plurality of light-emitting diodes (LEDs), each LED having at least a first light-emitting surface and a second surface, at least one of the first and the second surface being substantially flat. The illumination further includes a plurality of electrical pathways, selectively connected to the respective LEDs, such that each LED can be individually controlled and a leveling surface. The leveling surface is substantially flat and in leveling contact with the at least one substantially flat surface of each LED, such that a two-dimensional array of LEDs extends in a plane parallel to the leveling surface.

Illumination system for use in a stereolithography apparatus

A tight-fitting garment comprising a dipole resonator which is adapted to vary its length and/or shape in conformity with the length and/or shape variations of a person wearing the garment. The length and/or shape of the resonator determines the resonance frequency which can be detected by a reflection analyzer. The dipole resonator comprises at least one elastic core around which a conductive wire is wound. The dipole resonator is further suitable to elastically deform along with the tight-fitting garment.

Tight-fitting garment including a sensor for measuring length and/or shape

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Grubbenvorst, Netherlands

Antonius Hubertus Joannes Gerardus Lommen