Asml Netherlands B.v.

Oce-nederland B.v.

Antonius Henricus Arends

Hans Butler

Nicolaas Ten Kate

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Frits Van Der Meulen

Martijn Houkes

Minne Cuperus

Mark Johannes Hermanus Frencken

Evert Hendrik Jan Draaijer

Johannes Hubertus Antonius Van De Rijdt

Marcel Koenraad Marie Baggen

Peter Paul Hempenius

Henricus Martinus Johannes Van De Groes

Niels Johannes Maria Bosch

Michael Johannes Christiaan Ronde

Robertus Jacobus Theodorus Van Kempen

Lucas Kuindersma

Kuo-Feng Tseng

Marijn Wilhelmus Gelten

An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

Electron beam inspection apparatus stage positioning

A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.

Lithographic apparatus, immersion projection apparatus and device manufacturing method

A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.

Method and Apparatus for controlling the sleep-mode of an image forming apparatus includes a movable and heatable element, a drive member for driving the element and a heating member for heating the element while it is being driven by said drive member. The drive member and heating member are controlled to keep the heatable element at a temperature below its normal operating temperature in order to reduce power consumption in the sleep-mode. The drive member and said heating member are energized and de-energized cyclically and the heating member, when switched on, is energized with full power. The movable and heatable element preferably is an intermediate belt for heat transferring/fixing a developed image to a recording medium.

Method and device for controlling a sleep-mode of an image forming

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Eindhoven, Netherlands

Antonius Henricus Arends