International Business Machines Corporation

Antonio Rogelio Lee

Kerry Alan Ortega

Paul Bao-Luo Chou

David Angell

Arthur Keller

Martin Clarence Sturzenbecker

Daniel Bolanos

Brian S Brooks

Waltraud Brunner

Thomas Netousek

Carmi Gazit

An embodiment for speech-to-text auto-scaling of computational resources is provided. The embodiment may include computing a delta for each word in a transcript between a wall clock time and a time when the word is delivered to a client. The embodiment may also include submitting the deltas to a group of metrics servers. The embodiment may further include requesting from the group of metrics servers current values of the deltas. The embodiment may also include determining whether the current values of the deltas exceed a pre-defined max-latency threshold. The embodiment may further include adjusting the allocated computational resources based on a frequency of the current values of the deltas that exceed the pre-defined max-latency threshold. The embodiment may also include creating a histogram from the current values of the deltas and scaling-up the allocated computational resources based on a percentage of data points that fall above the pre-defined max-latency threshold.

Speech-to-text auto-scaling for live use cases

A method and system for use with a computer recognition system to enroll a user. The method involves a series of steps. The invention provides a user with an enrollment script. The invention then receives a recording made with a transcription device of a dictation session in which the user has dictated at least a portion of the enrollment script. Additionally, the invention can enroll the user in the speech recognition system by decoding the recording and training the speech recognition system.

Off site voice enrollment on a transcription device for speech recognition

A method of monitoring the status of plasma in a chamber using real-time spectral data while conducting an etch process during the course of manufacturing of semiconductor wafers. Spectral data is collected during etching, with the spectral data characterizing an emission of light from etch species contained in the plasma, and maintaining the collected data as reference data. A model of principal components of the data is generated. Additional spectral data is extracted from the plasma and compared with the model. Discrepancies pinpoint the presence of foreign material faults and help determine the cause of the failures to ensure appropriate corrective action.

Monitoring and controlling plasma processes via optical emission using

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Scarsdale, NY, United States of America

Antonio Rogelio Lee