Asml Netherlands B.v.

Antonio Corradi

Duan-Fu Stephen Hsu

Thomas Theeuwes

Abraham Slachter

Brennan Peterson

Koen Wilhelmus Cornelis Adrianus Van Der Straten

Pieter Joseph Marie Wöltgens

Pioter Nikolski

Sunit Sondhi Mahajan

Sun Wook Jung

Disclosed is a method of determining a process window within a process space comprising obtaining contour data relating to features to be provided to a substrate across a plurality of layers, for each of a plurality of process conditions associated with providing the features across said plurality of layers and failure mode data describing constraints on the contour data across the plurality of layers. The failure mode data is applied to the contour data to determine a failure count for each process condition; and the process window is determined by associating each process condition to its corresponding failure count. Also disclosed is a method of determining an actuation constrained subspace of the process window based on actuation constraints imposed by the plurality of actuators.

Method for controlling a manufacturing process and associated apparatuses

A method for controlling a processing apparatus used in a semiconductor manufacturing process to form a structure on a substrate, the method including: obtaining a relationship between a geometric parameter of the structure and a performance characteristic of a device including the structure; and determining a process setting for the processing apparatus associated with a location on the substrate, wherein the process setting is at least partially based on an expected value of the geometric parameter of the structure when using the processing setting, a desired performance characteristic of the device and an expected physical yield margin or defect yield margin associated with the location on the substrate.

Method of manufacturing devices

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Eindhoven, Netherlands

Antonio Corradi