Asml Netherlands B.v.

Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno

Antonie Ellert Duisterwinkel

Adrianus Johannes Petrus Maria Vermeer

Carolus Ida Maria Antonius Spee

Norbertus Benedictus Koster

Hans Meiling

Bastiaan Matthias Mertens

Diederik Jan Maas

Willem Van Schaik

Axel Sebastiaan Lexmond

Bob Van Someren

Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The precursor injector head is arranged for injecting a precursor gas from the precursor supply into the deposition space for contacting the substrate surface. The apparatus is arranged for relative motion between the deposition space and the substrate in a plane of the substrate surface. The apparatus is provided with a confining structure arranged for confining the injected precursor gas to the deposition space adjacent to the substrate surface.

Apparatus and method for atomic layer deposition

In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.

Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects

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Delft, Netherlands

Antonie Ellert Duisterwinkel