U.S. Philips Corporation

Anton Heger

Jan Johannes Van Den Broek

Edward W A Young

An electrically resistive structure comprising a substrate (,) which is provided on at least one side with a first resistive film (,) and a second resistive film (,), the materials of these first and second films (,) being mutually different, whereby an anti-diffusion film (,) is disposed between the first and second films (,). The presence of such an anti-diffusion film (,) allows annealing of the resistive structure without significant degradation of its resistive properties. Suitable alloy materials for use in such an anti-diffusion film (,) include WTi, and particularly WTiN. Appropriate exemplary materials for the first resistive film (,) and second resistive film (,) include SiCr and CuNi alloys, respectively.

Electrically resistive structure

A description is given of a precision resistor. The resistor comprises a substrate having two connections which are electrically interconnected via a resistance path, said resistance path comprising a first path portion having a positive TCR and a second path portion having a negative TCR. The resistor is characterized in that the resistance material of both path portions is selected so that the resistance values and the absolute TCRs of both path portions are comparable and in that both path portions are trimmed so that the resistor has desired resistance and TCR values. Preferably, the resistance materials used for the path portions consist of an alloy of substantially the same composition on the basis of CuNi or NiCrAl. The invention makes it possible to very accurately and reproducibly mass-produce precision resistors.

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Eindhoven, Netherlands

Anton Heger