Leybold Aktiengesellschaft

Leybold-heraeus Gmbh

Anton Dietrich

Klaus Hartig

Joachim Szczyrbowski

Michael Scherer

Rainer Ludwig

Rolf Adam

Hans-Christian Schaefer

Dan M Goebel

Hans Aichert

Reiner Kukla

Robert W Conn

Gregor A Campbell

Gonde Dittmer

Hans Betz

Max Mayr

Friedrich Hass

Alfred Thelen

Stephan Rogels

Stefan Rogels

Albert Kastner

Werner Lenz

Magnets are arranged inside a rotating tubular target to form a racetrack-shaped plasma having two straight stretches parallel to the target axis and two end stretches connecting the straight stretches. In order to achieve uniform target erosion, the magnets are arranged so that the plasma is wider and therefore less intense over the end stretches than it is over the straight stretches.

Magnetron cathode for a rotating target

A transparent substrate, such as glass, having a solar control coating consisting of a CrN layer between two SnO, layers. The solar control coating is arranged on the back side of the substrate which will face away from an observer when in place. A sub-oxidic alloy, such as NiCrO is then applied to the solar control coating.

Method for producing an opaque substrate

A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).

Sputtering apparatus with rotating target and target cooling

Method for making glazing with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation as well as low surface resistance. On substrates of mineral glass a system of coatings is built up in the following order:

Method for the production of coated glass with a high transmissivity in

In a process for coating substrates 1, 35, for example aluminum ceramic plates 1 or polyimide films 35 with copper by means of a device including a direct current source 10 which is connected to a sputtering cathode 5, 30, 31 disposed in a process chamber 15, 15a, 32 which can be evacuated and this cathode electrically interacts with a copper target 3, 33, 34 which can be sputtered and the sputtered particles are deposited on the substrate 1, 35 whereby the argon gas can be introduced into the process chamber 15, 15a, 32 which can be evacuated, an oxygen inlet 20, 39 is provided in addition to the argon inlet 21, 40, whereby the supply of oxygen can be controlled via a valve 19, 43 inserted in the feed line 23, 39 and the amount of oxygen can be metered such that during a first process phase a copper oxide layer which functions as a bonding agent forms on the substrate 1, 35 and after adjusting the argon atmosphere in the process chamber 15, 15a, 32 pure copper is deposited as an electrically conductive layer.

Process for coating a dielectric substrate with copper

In a method for the production of sheets of mineral glass with high transmission in the visible spectral range and with low solar energy transmission, a coating is sputtered onto the sheet in a coating chamber by cathode sputtering with a target of an alloy of 65% tin and 35% nickel in an atmosphere with an oxygen content. The sheet and coating are then heated at 640.degree. C. and then bent in the heated state, thus producing an especially stable and electrically conductive combination.

Method for producing glass of high transmission in the visible spectral

Process for the production of contact strips on substrates, especially on plates of mineral glass. These substrates are provided with an electrically conductive surface coating which is coated on the side facing away from the substrate with at least one surface layer of a dielectric material. For the production of the contact strips, a noble metal suspension in a liquid is deposited according to the invention on the surface layer in the pattern of the contact strips. Then the substrate with the pack of layers is exposed to a heat treatment at at least 100.degree. C. until a lowered total resistance occurs through the conductive surface coating between the contact strips.

Glazing having contact strips on a substrate

Process for coating transparent substrates, for example float glass, with a transparent dielectric layer having a low refractive index (n&lt;1.7) at a high layer growth rate (&gt;6.0A cm.sup.2 /W sec) by means of reactive direct current cathode sputtering. A vacuum chamber includes a cathode 5 which is provided on one of its surfaces with the material (target) to be sputtered and deposited on the substrate 3. The material to be sputtered (target) is a silicide, preferably nickel disilicide (NiSi.sub.2), and the layer deposited on the substrate is the corresponding oxide, for example NiSi-oxide. The reactive gas introduced into the vacuum chamber is oxygen and the process gas is a noble gas.

Process for coating substrates made of a transparent material, for

The invention concerns apparatus for the application of thin layers on a substrate by means of a cathode sputtering process. A mechanical shutter is provided between a cathode to be sputtered and an anode, which shutter divides the space between the cathode and the substrate to be coated. In addition, glow discharge means is provided both between the anode and the shutter.

Apparatus for the application of thin layers to a substrate

A system of layers is built up on substrates of mineral glass in the following order: first layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or their mixed oxides; second layer: a metal from the group, tantalum, tungsten, nickel, iron; third layer: silver or a silver alloy containing at least 50 weight-percent of silver; fourth layer: a metal from the group, tantalum, tungsten, nickel, iron or their alloys; fifth layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide or their mixed oxides. After that, the substrate with all the coating layers is heated to the softening temperature of the glass in an oxidizing atmosphere and bent to the final shape.

Process for the production of curve glazing with a high transmittance in

An apparatus to apply materials to a substrate disposed in a vacuum chamber is disclosed. A separate generator chamber containing an electron emitter is connected to the vacuum chamber by a process chamber so that a plasma of controllable cross-sectional shape and large area is formed and guided by magnets toward a target system. Positive ions may be accelerated against the target by applying an adjustable negative voltage.

Method and apparatus for the application of materials

Method and equipment for coating substrates by means of a plasma

Process for producing contact strips on substrates, especially on glazing

Method for reactive vapor deposition of compounds of metals and semi-conductors on at least one substrate by glow discharge. Into a space between a magnetron cathode (1) with a target (5) and the substrate (11) an inert gas and a reaction gas for the formation of the desired compound with the target material are separately introduced. Two solve the problem of making it possible to maintain the vapor deposition process stable over long time periods, according to the invention, a flow restriction is introduced between the target (5) and the substrate (11) by a diaphragm (20), which amounts to at least 40% of the cross-section of the space. Further, the inert gas is fed between target (5) and aperture (20) at the periphery of the target. Moreover the reaction gas is fed to the mass flow through a distributor device (21) to one side of the diaphragm (20), and finally a glow discharge is also maintained in the region between diaphragm (20) and substrate (11) by means of an anode (25) exposed to the reaction gas arranged on the other side of the aperture.

Method and apparatus for reactive vapor deposition of compounds of metal

A method of producing glass sheets having good transmission behavior in the visible spectrum range and having good reflection behavior as regards heat radiation. A transparent substrate S is coated by cathodic atomization with, successively, a first oxide layer 1 comprising indium oxide, tin oxide or mixtures thereof, a layer 2 consisting of silver in a thickness of 5 to 50 n, a metallic layer 3 selected from aluminium, titanium, tantalum, chromium, manganese and zirconium in a thickness ranging from 1 to 5 nm and applied directly to the silver layer 2 for the purpose of maintaining the condition thereof, and a final protective oxide layer 4 of indium oxide, tin oxide or mixtures thereof.

Growing community of inventors

Wiesenfelden, Germany

Anton Dietrich