L'air Liquide, Soci&#xe9;t&#xe9; Anonyme Pour L'etude Et L'exploitation Des Proc&#xe9;d&#xe9;s Georges Claude

Saint-gobain Placo

Chryso

Antoine Colas

Christian Dussarrat

Clément Lansalot-Matras

Julien Lieffrig

Jong Min Kim

Frédéric Leising

Vincent Etienne Claude Froidevaux

Christophe Derly

Disclosed is a compound with the following formula (I):

Fluidizing compounds for hydraulic compositions

Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of:M(=O)(OR)&#x2003;&#x2003;Formula I,M(=O)(NR)&#x2003;&#x2003;Formula II,M(=O)(NR)&#x2003;&#x2003;Formula III,M(=NR)(OR)&#x2003;&#x2003;Formula IV, andM(=O)(OR)&#x2003;&#x2003;Formula V,wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR', wherein R&#x2032; is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.

Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films

Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of:M(&#x2550;O)(OR)&#x2003;&#x2003;Formula I,M(&#x2550;O)(NR)&#x2003;&#x2003;Formula II,M(&#x2550;O)(NR)&#x2003;&#x2003;Formula III,M(&#x2550;NR)(OR)&#x2003;&#x2003;Formula IV, andM(&#x2550;O)(OR)&#x2003;&#x2003;Formula V,wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR', wherein R&#x2032; is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.

Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(=O)(NR)Formula I, M(=O)(NR)Formula II, and M(=NR)(OR)Formula III, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR', wherein R&#x2032; is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.

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Ozoir la Ferriere, France

Antoine Colas