Texas Instruments Corporation

Anthony Yen

Jing-Shing Shu

Barundeb Dutta

An embodiment of the instant invention is an optical illumination system for illuminating the mask of an exposure apparatus for transferring the image of the pattern on the mask onto the semiconductor wafer, the optical illumination system comprising: illumination means (illumination means,of FIG.,) comprised of a plurality of light sources for emitting light beams along beam paths; and a lens system (lenses,and,of FIG.,) for focusing the light beams to the wafer, the lens system comprising at least one lens element positioned in the beams paths. Preferably, the light sources are individually addressable point like sources, and the optical illumination system further comprising a light control means for operating each of the light sources independently of the others. The plurality of light sources is, preferably, comprised of a matrix addressable array of electro-optic modulators (preferably comprised of LCD modulators); an array of semiconductor lasers (preferably an array of Vertical Cavity Surface Emitting Lasers); or an array of bonded edge emitting DFB lasers.

Optical illumination system and associated exposure apparatus

An improved microlithographic imaging system (100) is disclosed. The system comprises a filter (183) substantially aligned with a first image plane, adjacent to an aperture (185). The filter is formed in response to an image projected by a light source (110) through a reticle (160) onto the first image plane. The improved microlithographic imaging system has higher resolution and depth of focus than prior art imaging systems, due to the additional filtering performed by the filter (183). A filter in accordance with the invention can be fabricated easily and inexpensively, using conventional microlithography techniques. A filter in accordance with the invention can also be used to detect or correct flaws in the reticle (160).

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Dallas, TX, United States of America

Anthony Yen