Amo Manufacturing Usa, LLC

Kla-tencor Technologies Corporation

Anthony Tang

Ihor V Berezhnyy

Henry Price

Guangming Dai

Anatoly Fabrikant

Ching-Ling Meng

Ning-Yi Neil Wang

Benjamin A Logan

Stephen Calebotta

Embodiments of the present invention generally describe systems, devices, and methods for directly measuring pulse profiles during pulse delivery. In some embodiment, the pulse profiles may be measured while the pulse is delivered to ablate a material. Embodiments, may calculate ablation spot parameters based on the pulse profiles and may refine one or more subsequent laser pulses based on deviations from the calculated ablation spot parameters from desired ablation spot parameters. In some embodiments, a fluence profiler is provided. The fluence profiler may measure a pulse profile of a laser pulse from a portion of the laser pulse. The fluence profiler may utilize a UV radiation energy sensor device and a camera-based imager. The measurements from the UV radiation energy sensor device and the camera-based imager may be combined and scaled to provide a measured pulse profile that corresponds to the delivered pulse.

Systems and methods for laser beam direct measurement and error budget

Embodiments generally describe systems, devices, and methods for focusing and calibrating beam profilers. A test object is provided that may include an internal housing rotatable within an external housing. The internal housing may house a light source, a collimator, a filter, and/or a diffuser. A plate may be mounted to the internal housing and may include a plurality of markings. In some embodiments, to focus a beam profiler, the test object may be positioned adjacent the converter plate of a beam profiler. Marker images may be captured and a focus quality may be assessed therefrom. A position of the converter, objective, and/or camera of the beam profiler may be adjusted based on the focus quality. To calibrate, images of the markings in several rotational positions may be captured and used for calibration. The markings may be rotated to several positions by rotating the internal housing relative to the external housing.

Systems, devices, and methods for calibration of beam profilers

Gas purge systems and methods and a spectroscopic ellipsometer are disclosed. A purge gas system may include an input beam optics housing, a collection optics housing and a gas purge manifold. The input beam optics housing may include a first gas flow path between a first gas inlet and an aperture in a first nose cone proximate a measurement position. The collection optics housing may include a second gas flow path between a second gas inlet and an aperture in a second nose cone proximate the measurement position. The gas purge manifold may be disposed between the input beam optics housing and the collection optics housing. The gas purge manifold has a third gas flow path between a third gas inlet and an aperture in the gas manifold proximate the measurement position. The ellipsometer may include input beam optics in the input beam optics housing and collection optics in the collection optics housing. First, second, and third flows of purge gas may be supplied through the input beam optics housing, collection optics housing and gas purge manifold respectively. The purge gas is delivered directly to a measurement position of a surface of a substrate through the gas purge manifold, the first nosecone and the second nose cone.

Gas purge system and methods

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San Jose, CA, United States of America

Anthony Tang