Ethicon, Gmbh

Rev Pharmaceuticals, Inc.

Johnson & Johnson Gmbh

Advanced Sterilization Products

Johnson & Johnson Medical Div Ethicon, Inc.

Anthony Lemus

Robert C Platt

Beth Anne-Szkudlarek Brown

Alfredo M Choperena

Marnie L Peterson

Mitch Agamohamadi

Szu-Min Lin

Paul Taylor Jacobs

Harold R Williams

Tralance O Addy

Jon Morrell Jacobs

Debra Timm

Robert C Platt, Jr

John Chien

A topical composition and method comprising administering physiological effective amounts of at least two active components forskolin combined with one or more lubricating base components. Active components may include one or more of L-arginine free base, hydrochloride salt, ethyl ester or combinations thereof.

Sexual health enhancement composition

A topical composition that includes L-arginine that is used as a sports health composition. The composition can further include forskolin. Disclosed is a method of using the topical composition.

Sports health performance composition

A sterilization process challenge device has a sterilization indicator contained within a container; and a variable diffusion restriction into said container.

Variable resistance sterilization process challenge device and method

A method for sterilizing medical devices and similar instruments in diffusion-restricted containers is provided. The sterilization method includes placing a liquid solution containing vaporizable germicide such as hydrogen peroxide into the diffusion-restricted container and vaporizing the germicide. The containers can be attachable and detachable to a sterilization system, and used as a vacuum chamber. An attachable/detachable container containing an article to be sterilized can be nested with a second container, and the article and inside and outside of the inner container are sterilized. The sterile article inside the nested containers can be transported and the sterile inner container with the sterilized article can removed from the outer container and placed in a sterile environment without contaminating the sterile environment. The sterile article can then be removed from the sterile container and utilized. Alternatively, the sterilization method may include introducing germicide vapor into an attachable/detachable container.

Method for sterilizing devices in a container

The present invention provides a power feedback control system for controllably maintaining a predetermined average power value of a power applied to a plasma of a sterilization system. The power has a frequency of from 0 to approximately 200 kHz. The power feedback control system includes a power monitor including a current monitor and a voltage monitor. The current monitor is adapted to produce a first signal indicative of a current applied to the plasma. The voltage monitor is adapted to produce a second signal indicative of a voltage applied to the plasma. The power monitor is adapted to produce a third signal in response to the first signal and second signal. The third signal is indicative of the power applied to the plasma. The power feedback control system further includes a power control module adapted to produce a fourth signal in response to the third signal from the power monitor and to a reference signal corresponding to the predetermined average power value. The power feedback control system further includes a power controller adapted to adjust, in response to the fourth signal, the power applied to the plasma to maintain the predetermined average power value of the power applied to the plasma.

Power system for sterilization systems employing low frequency plasma

A sterilization system and method applies low frequency power to a plasma within a vacuum chamber to remove gas or vapor species from an article. The sterilization system includes a switching module adapted to pulsate the low frequency power applied to the plasma and a low frequency power feedback control system for controllably adjusting the low frequency power applied to the plasma. A power monitor is adapted to produce a first signal indicative of the low frequency power applied to the plasma within the vacuum chamber. A power control module is adapted to produce a second signal in response to the first signal from the power monitor, and a power controller is adapted to adjust, in response to the second signal, the low frequency power applied to the plasma to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed.

Sterilization system employing a switching module adapted to pulsate the low frequency power applied to a plasma

A sterilization system applies power to a plasma within a chamber to remove gas or vapor species from an article. The sterilization system includes a power feedback control system for controlling the power applied to the plasma. The power feedback control system includes a current monitor adapted to produce a first signal indicative of a current applied to the plasma within the chamber. The power feedback control system further includes a voltage monitor adapted to produce a second signal indicative of a voltage applied to the plasma within the chamber. The power feedback control system further includes a power control module comprising a programmable digital signal processor. The digital signal processor is adapted to receive and process the first signal and the second signal by multiplying the current and the voltage and producing a third signal indicative of the product of the current and the voltage. The power feedback control system further includes a plasma generator coupled to the power control module and adapted to adjust, in response to the third signal, the power applied to the plasma within the chamber.

Sterilization system with a plasma generator controlled by a digital signal processor

The present invention provides a sterilization system that includes a low frequency power feedback control system for controllably adjusting a power applied to a low frequency plasma within a vacuum chamber of the sterilization system to remove gas or vapor species from the article. The power has a frequency of from 0 to approximately 200 kHz. The low frequency power feedback control system includes a power monitor adapted to produce a first signal indicative of the power applied to the low frequency plasma within the vacuum chamber. The low frequency power feedback control system further includes a power control module adapted to produce a second signal in response to the first signal from the power monitor, and a power controller adapted to adjust, in response to the second signal, the power applied to the low frequency plasma to maintain a substantially stable average power applied to the low frequency plasma while the article is being processed.

Growing community of inventors

Villa Park, CA, United States of America

Anthony Lemus