International Business Machines Corporation

Daimler Ag

Anthony Fong

Young-Hye Na

Jangwoo Kim

Tobias Glossmann

Maxwell Giammona

Eunseok Lee

Gregory Michael Wallraff

Krystelle Lionti

Aakash Pushp

Noel Arellano

Benjamin Madon

Brian Peter Hughes

M A Mueed

Vincent Ouazan-Reboul

Forming a hardmask layer for reactive ion etching includes depositing a hardmask above an underlayer. The hardmask includes a layer of magnesium oxide having a thickness of up to 10 nm. A resist layer is deposited above the hardmask and developed to form a pattern that exposes portions of the hardmask. The pattern is transferred from the resist layer to the hardmask by rinsing exposed portions of the hardmask with a deionized water solution.

Magnesium oxide based hardmask for reactive ion etching

A rechargeable metal halide battery shows increased metal halide utilization with the introduction of electronegative heteroatom-enriched conductive additives into a metal halide cathode incorporated into an electrically conductive material. The electronegative heteroatom-enriched conductive additives include nitrogen-doped carbon, such as nitrogen-doped single layer graphene, and oxygen-enriched carbon, such as acid-treated carbon black. The modified batteries utilize 20-30% more metal halide than unmodified batteries resulting in enhanced specific capacity and energy density.

Metal halide cathode with enriched conductive additive

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San Jose, CA, United States of America

Anthony Fong