The Secretary of State for Defence in Her Britannic Majesty's Government

Qinetiq Limited

The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Northern Ireland

The Secretary of State for Defense in Her Britannic Majesty's Government

Secretary of State for Defence Acting Through His Defence Evaluation &

Anthony Copeland Jones

David John Cole-Hamilton

John B Mullin

Peter J Wright

Simon Andrew Rushworth

Trevor Martin

Timothy J Leedham

Richard William Freer

Timothy John Whittaker

Arthur K Holliday

Michael J Crosbie

Dennis J Williams

Neil D Gerrard

Penelope A Lane

Metalorganic precursors for deposition of strontium tantalum and strontium niobium oxides by MOCVD techniques have the formula Sr&lsqb;M(OR ) L &rsqb; wherein x is form 1 to 6; M is Ta or Nb; R is a straight or branched chain alkyl group; and L is an alkoxide group.

Precursors for growth of heterometal-oxide films by MOCVD

Zirconium precursors for use in depositing thin films of or containing zirconium oxide using an MOCVD technique have the following general formula: Zr (OR) L, wherein R is an alkyl group; L is a &bgr;-diketonate group; x&equals;1 or 2; y&equals;2, 4 or 6; and z&equals;1 or 2.

Chemical vapor deposition precursors

Formation of a metalorganic compound for growing epitaxial semiconductor

Metalorganic compounds

A method of producing a trialkyl gallium compound (R.sub.A).sub.3 Ga, where R.sub.A is selected from methyl and ethyl, includes the step of reacting a gallium trihalide with a Grignard reagent of formula R.sub.A Mg Q, where Q is a halogen, the reaction being carried out in the presence of an ether of the formula R.sub.1 R.sub.2 O having a boiling point at least 50 Celsius degrees above that of the trialkyl gallium compound (R.sub.A).sub.3 Ga, wherein R.sub.1 and R.sub.2 are organic radicals at least one of which has at least 5 carbon atoms. The organic radicals R.sub.1 and R.sub.2 may be aromatic and/or aliphatic radicals. They are preferably alkyl or phenyl radicals. Preferably R.sub.1 R.sub.2 O is an ether having a boiling point more than 100.degree. C. above that of the trialkyl gallium compound. The radicals R.sub.1 and R.sub.2 may each independently have from 1 to 14 carbon atoms but preferably together R.sub.1 and R.sub.2 have between seven and twelve carbon atoms inclusive. Desirably, R.sub.1 R.sub.2 O is di-isopentyl ether (3,3-dimethylpropyl) ether. Other examples of R.sub.1 R.sub.2 O are diphenyl ether and anisole (methylphenyl ether). Preferably, Q is iodine and the gallium trihalide is a chloride.

Preparation of metal alkyls

A method of producing an adduct of an organometallic compound M(R.sup.1).sub.3 where M is either indium or gallium and (R.sup.1).sub.3 represents a plurality of organic radicals which may be the same or different, preferably methyl or ethyl groups, comprising electrolysing, using a sacrificial anode of the metal M, a solution containing components 1 and 2 as follows:

Preparation of adducts

A method of producing an adduct of an organometallic compound M.sup.1 (R.sup.1).sub.x, where M.sup.1 is a Group II or Group III metallic element and R.sup.1).sub.x represents a plurality of organic radicals, which may be the same or different, x being an integer equal to the valency of M.sup.1, comprises electrolysing, using a sacrificial anode of the metal M.sup.1, a solution containing components A, B and C as follows:

Preparation of adducts which may be used in the preparation of compound

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Prescot, United Kingdom

Anthony Copeland Jones