Asml Netherlands B.v.

Anthonie Kuijper

Hans Jansen

Marco Koert Stavenga

Franciscus Johannes Joseph Janssen

Jacobus Johannus Leonardus Hendricus Verspay

Nicolaas Ten Kate

Joost Jeroen Ottens

Nicolaas Rudolf Kemper

Michel Riepen

Marcel Beckers

Koen Steffens

Antonius Johannus Van Der Net

Marco Polizzi

Pieter Jacob Kramer

Adrianes Johannes Baeten

Arjan Hubrecht Josef Anna Martens

Anca Mihaela Antonevici

Christiaan Alexander Hoogendam

Martinus Hendrikus Antonius Leenders

Timotheus Franciscus Sengers

Roelof Frederik De Graaf

Erik Henricus Egidius Catharina Eummelen

Richard Joseph Bruls

Frank Johannes Jacobus Van Boxtel

Bauke Jansen

Kornelis Tijmen Hoekerd

Jeroen Gerard Gosen

Jean-Philippe Xavier Van Damme

Justin Johannes Hermanus Gerritzen

Sandra Van Der Graaf

Eric Willem Felix Casimiri

Franciscus Joannes Anthonius Evers

Jaap Wilhelmus Petrus Van Empel

Léon Hubert Joseph Coumans

Alexandre Viktorovych Padiy

Peter Schoenmakers

An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Immersion liquid, exposure apparatus, and exposure process

An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

Lithographic apparatus, drying device, metrology apparatus and device manufacturing method

A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.

Lithographic apparatus and device manufacturing method

An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.

Lithographic apparatus and a method of operating the apparatus

A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.

Lithographic apparatus and a method of measuring flow rate in a two phase flow

A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors.

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Anthonie Kuijper