The University of North Carolina at Chapel Hill

Ansley E Dennis

Jason P Rolland

Joseph Desimone

Edward T Samulski

Ginger Denison Rothrock

Benjamin Maynor

R Jude Samulski

Larken Elizabeth Euliss

Larkin E Euliss

Larken E Euliss

Joseph M Desimone

Benjamin W Maynor

Alexander Ermoshkin

Ginger Rothrock-Denison

Stephanie Gratton

Andrew James Murphy

The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.

Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography

Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography

The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.

Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography

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Augusta, GA, United States of America

Ansley E Dennis