Asml Netherlands B.v.

Anne Johannes Wilhelmus Van Lievenoogen

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Frits Van Der Meulen

Paul Janssen

Derk Servatius Gertruda Brouns

Robert Gabriël Maria Lansbergen

Matthias Kruizinga

Jeroen Dekkers

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Gerrit Van Den Bosch

Angelo Cesar Peter De Klerk

Maarten Mathijs Marinus Jansen

Jérôme François Sylvain Virgile Van Loo

Jorge Manuel Azeredo Lima

Marc Bruijn

Silvester Matheus Reijnders

Ronald Harm Gunther Kramer

Jacobus Maria Dings

Maurice Leonardus Johannes Janssen

Roland Jacobus Johannes Kerstens

Michel Loos

Geert Middel

Frank Johannes Christiaan Theuerzeit

Martinus Jozef Maria Kester

Martinus Jozef Maria Kesters

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Pellicle attachment apparatus

A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.

Growing community of inventors

Vught, Netherlands

Anne Johannes Wilhelmus Van Lievenoogen