Saint-gobain Glass France

Saint-gobian Glass France

Anne Durandeau

Andriy Kharchenko

Nicolas Nadaud

Ulrich Billert

Georges Zagdoun

Emmanuel Valentin

Xavier Talpaert

Ulf Blieske

Bernard Nghiem

Norbert Huhn

Emilie Viasnoff

Laurent Joret

Hadia Gerardin

Etienne Sandre-Chardonnal

Bruno Mauvernay

Stephane Laurent

Marie-Jose Azzopardi

Eddy Royer

Pierre-Alain Gillet

Bertrand Kuhn

David Le Bellac

Michel Simonet

Maxime Duran

Fabrice Abbott

Olivier Dubois

Corinne Victor

Emilie Thollas

Olaf Stahlschmidt

Sebastien Roy

Anne Lorren

One subject of the invention is a material comprising a substrate coated on at least one portion of at least one of its faces with a stack comprising a photocatalytic layer, the geometrical thickness of which is between 2 and 30 nm, and at least one pair of respectively high and low refractive index layers positioned underneath said photocatalytic layer so that in the or each pair, the or each high refractive index layer is closest to the substrate, said material being such that the optical thickness, for a wavelength of 350 nm, of the or each high refractive index layer, except the photocatalytic layer, is between 170 and 300 nm and the optical thickness, for a wavelength of 350 nm, of the or each low refractive index layer is between 30 and 90 nm.

Photocatalytic material

The subject of the invention is a material comprising a glass substrate coated on at least one of its faces with a thin-film multilayer comprising, starting from said substrate, at least one lower dielectric layer, at least one functional layer made of a metal or metal nitride, at least one upper dielectric layer and at least one layer of titanium oxide at least partially crystallized in the anatase form, said metal or metal nitride being based on Nb, NbN, W, WN, Ta, TaN or any of their alloys or solid solutions.

Material and glazing comprising said material

The subject of the invention is a process for obtaining a substrate coated on at least part of its surface with at least one film of oxide of a metal M the physical thickness of which is 30 nm or less, said oxide film not being part of a multilayer comprising at least one silver film, said process comprising the following steps:

Thin film deposition method

The subject of the invention is a process for obtaining a material comprising a substrate and at least one at least partially crystalline titanium-oxide-based thin film deposited on a first side of said substrate, said process comprising the following steps:

Method for thin layer deposition

Glass substrate coated with layers having an improved mechanical strength

Process for depositing, on a substrate, a coating based on titanium oxide, which is characterized in that the coating with photocatalytic properties is deposited by chemical vapor deposition, especially from a gas mixture comprising at least one organometallic precursor and/or a metal halide of said metal oxide, the deposition being enhanced by a plasma source.

Method for deposition of titanium oxide by a plasma source

The invention relates to a glass substrate () provided with an electrode comprising at least one metal oxide-based transparent conducting layer (), characterized in that said layer has an RMS roughness of at least 3 nm, especially of at least 5 nm and/or a mean feature size for this roughness of at least 50 nm.

Transparent substrate comprising an electrode

A transparent substrate including an antireflection coating, made from a stack of thin layers of dielectric material having alternately high and low refractive indices. This stack includes a high-index first layer having a refractive index n, of between 1.8 and 2.2 and a geometrical thickness eof between 5 and 50 nm, a low-index second layer having a refractive index nof between 1.35 and 1.65 and a geometrical thickness eof between 5 and 50 nm, a high-index third layer having a refractive index nof between 1.8 and 2.2 and a geometrical thickness eof between 70 and 120 nm, and a low-index fourth layer having a refractive index nof between 1.35 and 1:65 and a geometrical thickness eof at least 80 nm.

Transparent substrate comprising an antiglare coating

The subject of the invention is a transparent substrate, especially made of glass, provided on at least one of its faces with a layer based on an at least partially oxidized silicon derivative chosen from silicon dioxide or silicon oxides which are substoichiometric in terms of oxygen, silicon oxycarbide or silicon oxynitride, and having a hydrophilic character.

Transparent substrate provided with a silicon derivative layer

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Paris, France

Anne Durandeau