International Business Machines Corporation

Applied Materials, Inc.

Meta Platforms Technologies, LLC

Globalfoundries Inc.

Facebook Technologies, LLC

King Abdulaziz City for Science and Technology

Ndsu-research Foundation

Az Electronic Materials (luxembourg) S.a.r.l.

Ankit Vora

Daniel Sanders

Joy Cheng

Young-Hye Na

Ratnam Sooriyakumaran

Anindarupa Chunder

Kristin Schmidt

Melia Tjio

Jacquana T Diep

Chi-Chun Liu

Matthew E Colburn

Sivapackia Ganapathiappan

Nag B Patibandla

Rajeev Bajaj

Teddie Peregrino Magbitang

Daniel Redfield

Alshakim Nelson

Austin Lane

Boyi Fu

Sanjay C Mehta

Dario Leonardo Goldfarb

Muthumanickam Sankarapandian

Martin Glodde

Nihar Ranjan Mohanty

Ashwin Chockalingam

Mayu Felicia Yamamura

Geraud J Dubois

Blake W Davis

Mario Dagio Cornejo

Keren Zhang

Noel Arellano

Luciana Meli

Elliott Franke

Radwan A Alrasheed

Majed S Nassar

Sivananda K Kanakasabapathy

Hou Tee Ng

Rudy J Wojtecki

Dominic J Benvegnu

Philip Allan Kraus

Giuseppe Calafiore

Kafai Lai

Sean David Burns

Dean C Webster

Joseph R Johnson

Hoa D Truong

Amanda Catherine Engler

Wei Han

Tingling Rao

Guanyang Lin

Kenichi Ohno

Mu San Zhang

Jed Walter Pitera

Hareem Tariq Maune

Margareta Paunescu

Zohreh Hesabi

Durairaj Baskaran

Venkat Hariharan

Neena Ravindran

Orest Polishchuk

Richard Farrell

Sudhakar Madhusoodhanan

Feyza Dundar Arisoy

Peter Topalian

Igor Abramson

Mo Yang

Marvin Dion Alim

Eri Hirahara

The present disclosure relates to systems and methods of making polymeric optical layers for optical layering applications. In an aspect, a waveguide device for a head mounted display is provided. The waveguide device may include a waveguide die having a first refractive index range and a polymeric optical layer. The polymeric optical layer may include a second refractive index range that is different from the first refractive index range and a thiol-containing polymer. For example, the thiol-containing polymer may include thiourethane. In some embodiments, the thiol-containing polymer may be formed from a monomer mixture including a thiol-containing compound and an isocyanate. For example, the thiol-containing compound may include 4-mercaptomethyl-3,6-dithia-1,8-octanedithiol (MDTODT) and/or the isocyanate may include m-xylylene diisocyanate (XDI). In some embodiments, the monomer mixture may include a second thiol-containing compound, such as, for example, 1,3-benzene dithiol (1,3-BDT).

Systems and methods of making polymeric optical layers for optical layering

An optical device includes an overcoat layer on a surface-relief grating. The overcoat layer is formed by a process including: depositing a layer of a first resin material that is curable by heat or electromagnetic radiation on a surface-relief grating that includes a plurality of grating ridges and a plurality of grating grooves to at least partially fill the plurality of grating grooves, curing the layer of the first resin material, depositing a layer of a second resin material that is curable by heat or electromagnetic radiation and has a higher flowability than the first resin material on the layer of the first resin material, annealing the layer of the second resin material to allow the second resin material to flow and form a planar top surface, and curing the layer of the second resin material.

Coating composition and planarization of high refractive index overcoat on gratings

A method of planarizing an overcoat layer on a surface-relief grating includes dispensing a layer of a resin material that is curable by heat or electromagnetic radiation on a surface-relief grating that includes a plurality of grating grooves, pressing the layer of the resin material using a planar imprint stamp, curing the resin material in the layer of the resin material, and detaching the planar imprint stamp from the layer of the resin material. In one example, a thickness of the overcoat layer on top of grating ridges of the surface-relief grating is equal to or less than 20 nm, and a surface peak-to-valley height of a top surface of the overcoat layer is equal to or less than 5 nm.

Techniques for controlling overburden planarization

In one implementation, a method of forming a porous polishing pad is provided. The method comprises depositing a plurality of composite layers with a 3D printer to reach a target thickness. Depositing the plurality of composite layers comprises dispensing one or more droplets of a curable resin precursor composition onto a support. Depositing the plurality of composite layers further comprises dispensing one or more droplets of a porosity-forming composition onto the support, wherein at least one component of the porosity-forming composition is removable to form the pores in the porous polishing pad.

Hydrophilic and zeta potential tunable chemical mechanical polishing pads

Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.

Gray-tone lithography for precise control of grating etch depth

Methods and formulations for manufacturing polishing articles used in polishing processes are provided. In one implementation, a UV curable resin precursor composition is provided. The UV curable resin precursor comprises a precursor formulation. The precursor formulation comprises a first resin precursor component that comprises a semi-crystalline radiation curable oligomeric material, wherein the semi-crystalline radiation curable oligomeric material is selected from a semi-crystalline aliphatic polyester urethane acrylate, a semi-crystalline aliphatic polycarbonate urethane acrylate, a semi-crystalline aliphatic polyether urethane acrylate, or combinations thereof. The precursor formulation further comprises a second resin precursor component that comprises a monofunctional or multifunctional acrylate monomer. The resin precursor formulation further comprises a photoinitiator, wherein the precursor formulation has a viscosity that enables the precursor formulation to be dispensed to form a portion of a polishing article by an additive manufacturing process.

Formulations for advanced polishing pads

The disclosure provides high refractive index ceramic material nanoimprint lithography (NIL) gratings having a relatively lower amount of carbon compared to traditional NIL gratings, and methods of making and using thereof, and devices including such gratings. The ceramic material includes one or more of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or any combination or derivative thereof.

Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon

An imaging waveguide for a visual display includes a substrate for guiding image light therein by total internal reflection (TIR). An input grating is supported by the substrate for coupling the image light into the imaging waveguide. An output grating is supported by the substrate and spaced apart from the input grating for coupling the image light guided in the substrate out of the imaging waveguide for observation by a user. A gap filling overcoat is formed on and within the output grating, but not on or within the input grating. The material is characterized by a refractive index between 1.40 and 1.80 at 500 nm, absorption between 0% and 1% in the visible region of the electromagnetic spectrum, and % haze between 0% and 0.2% in the visible region of the electromagnetic spectrum.

Imageable overcoat for an optical waveguide and process for making the same

Embodiments of the present disclosure provide for polishing pads that include at least one endpoint detection (EPD) window disposed through the polishing pad material, and methods of forming thereof. In one embodiment a method of forming a polishing pad includes forming a first layer of the polishing pad by dispensing a first precursor composition and a window precursor composition, the first layer comprising at least portions of each of a first polishing pad element and a window feature, and partially curing the dispensed first precursor composition and the dispensed window precursor composition disposed within the first layer.

Polishing pad with window and manufacturing methods thereof

Disclosed herein are techniques for fabricating straight or slanted variable-etch-depth gratings. A photoresist material for fabricating a variable-etch-depth grating in a substrate is sensitive to light with a wavelength shorter than 300 nm and has an etch rate comparable to the etch rate of the substrate. A depth of an exposed portion of a photoresist material layer including the photoresist material correlates with the exposure dose. After exposure using a gray-scale mask and development, the photoresist material layer has a non-uniform thickness. The photoresist material layer with the non-uniform thickness and the underlying substrate are etched using a straight etching or slanted etching process to form the straight or slanted variable-etch-depth grating in the substrate. The variable-etch-depth grating is characterized by a non-uniform depth profile corresponding to the non-uniform thickness of the photoresist material layer before etching.

Variable-etch-depth gratings

Methods of manufacturing well-controlled nanopores using directed self-assembly and methods of manufacturing free-standing membranes using selective etching are disclosed. In one aspect, one or more nanopores are formed by directed self-assembly with block co-polymers to shrink the critical dimension of a feature which is then transferred to a thin film. In another aspect, a method includes providing a substrate having a thin film over a highly etchable layer thereof, forming one or more nanopores through the thin film over the highly etchable layer, for example, by a pore diameter reduction process, and then selectively removing a portion of the highly etchable layer under the one or more nanopores to form a thin, free-standing membrane.

Method to create a free-standing membrane for biological applications

A vertical field-effect transistor and a method for fabricating the same. The vertical field-effect transistor includes a substrate and a bottom source/drain region. The vertical field-effect transistor also includes at least one fin structure, and further includes a bottom spacer layer. The bottom spacer layer has a substantially uniform thickness with a thickness variation of less than 3 nm. A gate structure contacts the bottom spacer layer and at least one fin structure. The method includes forming a structure including a substrate, a source/drain region, and one or more fins. A polymer brush spacer is formed in contact with at least sidewalls of the one or more fins. A polymer brush layer is formed in contact with at least the source/drain region and the polymer brush spacer. The polymer brush spacer is removed. Then, the polymer brush layer is reflowed to the sidewalls of the at least one fin.

Vertical field-effect-transistors having a silicon oxide layer with controlled thickness

A polymer brush with a plurality of repeat units wherein some portions of the repeat units have one or more grafting groups and some portions have one or more interface tuning groups is disclosed. The grafting groups are selected based on the identity of an inorganic substrate, and the interface tuning groups are selected based on the identity of a photoresist that will interact with the groups. A process of lithographic patterning and an electronic device comprising at least one integrated circuit formed by the process of lithographic patterning are disclosed as well. The process comprises providing an inorganic substrate, depositing the disclosed polymer brush onto the inorganic substrate, and depositing a photoresist onto the polymer brush. The process further comprises masking the photoresist with a photomask having a pattern, and applying energy to the masked photoresist to form an etch mask. The inorganic substrate is then etched.

Polymer brushes for extreme ultraviolet photolithography

Lithographic patterning methods are provided which implement directed self-assembly (DSA) of block copolymers to enable self-aligned cutting of features. A first layer and second layer of material are formed on a substrate. The second layer of material is lithographically patterning to form a guiding pattern. A DSA process is performed to form a block copolymer pattern around the guiding pattern, which comprises a repeating block chain that includes at least a first block material and a second block material, which have etch selectivity with respect to each other. A selective etch process is performed to selectively etching one of the first block material and the second block material to form self-aligned openings in the block copolymer pattern which expose portions of the first layer of material. The first layer of material is patterned by etching the exposed portions of the first layer of material.

Self-aligned patterning methods which implement directed self-assembly

A thin film composite membrane includes an active layer on a support membrane, wherein the active layer includes at least two chemically distinct first and second crosslinked polyamide film sub-layers. The first film sub-layer includes a polyamide unit; and the second film sub-layer includes a copolyamide with two chemically distinct polyamide units. The first film sub-layer is closer to the support than is the second film sub-layer.

Composite membrane with multi-layered active layer

Growing community of inventors

San Jose, CA, United States of America

Ankit Vora