Veeco Instruments Inc.

Aniruddha Bagchi

Alexander I Gurary

Sandeep Krishnan

Bojan Mitrovic

Yuliy Rashkovsky

Chenghung Paul Chang

Matthew J Van Doren

Ian Kunsch

Siddharth Patel

A substrate reactor with centering pin for epitaxial deposition includes a vacuum chamber and a tube configured to rotate in the vacuum chamber around a tube geometrical center axis. A substrate carrier forming a pocket dimensioned for holding a substrate on a top surface includes an aperture that is centrally located on a bottom surface. The substrate carrier is positioned on and in contact with a top surface of the tube. A centering pin is positioned along a geometrical center axis of rotation of the substrate carrier. The centering pin has a first end positioned in the aperture on the bottom surface of the substrate carrier and a second end fixed inside the reactor so that the substrate carrier rotates around the geometrical center axis of the substrate carrier independent of the geometrical center axis of the tube.

Reactor with centering pin for epitaxial deposition

Multi-filament heater assembly

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Belle Mead, NJ, United States of America

Aniruddha Bagchi