Uchicago Argonne, LLC

Boise State University

Other

Northwestern University

Kla Tencor Corporation

University of Chicago

Incom Corporation

Anil U Mane

Jeffrey W Elam

Devika Choudhury

Jason R Croy

Seth B Darling

Joseph A Libera

Angel Yanguas-Gil

Joong Sun Park

Steven Payonk Letourneau

Donghyeon Kang

Michael J Pellin

Alan D Brodie

William M Tong

Elton Graugnard

Robert G Wagner

Lei Xia

Jingbo Wang

Junqi Xie

Howard Nicholson

Kaizhong Gao

Ali Erdemir

Seth W Snyder

John N Hryn

Hakim H Iddir

Osman Eryilmaz

Henry J Frisch

Chien-min Kao

Eungje Lee

Chin-Tu Chen

Arturo Gutierrez

Alex B Martinson

Yuepeng Zhang

Qing Peng

Mahalingam Balasubramanian

Fukun Tang

Michael Minot

Nestor J Zaluzec

Matthias John Young

Yujia Liang

Jean-Francois Genat

Jihyeon Gim

Giovanni Ramirez

Maximillian Gebhard

Hervé Grabas

Heejong Kim

Aliraeza Nassiri

David Joseph Mandia

Stephen Magill

Mark Popecki

Sara Kuraitis

HackSung Kim

A process for forming a lithium-metal-oxygen film on a lithium SSE. A metal-ligand complex is exposed to the SSE such as for 30-600 seconds in a chemical vapor transfer reactor at a temperature of 200-350° C.

Formation of lithium-metal-oxygen layer and removal of lithium carbonate on solid state electrolytes

A method for coating of lithium ion electrode materials via atomic layer deposition. The coated materials may be integrated in part as a dopant in the electrode itself via heat treatment forming a doped lithium electrode.

Modification of lithium ion electrode materials via atomic layer deposition techniques

A method of making thin films of sodium fluorides and their derivatives by atomic layer deposition ('ALD'). A sodium precursor is exposed to a substrate in an ALD reactor. The sodium precursor is purged, leaving the substrate with a sodium intermediate bound thereon. A fluorine precursor is exposed to the bound sodium intermediate in the ALD reactor. The fluorine precursor is purged and a sodium fluoride film is formed on the substrate.

Method of making thin films of sodium fluorides and their derivatives by ALD

A lithium boron coating and a method of producing the same. Atomic layer deposition deposits lithium and boron to form a lithium borate layer. The lithium borate maybe deposited as a solid electrolyte.

Atomic layer deposition of lithium boron comprising nanocomposite solid electrolytes

A secondary electron emissive layer resistant to infiltration and fouling. A barrier layer is formed by atomic layer deposition. The barrier layer may be an emissive layer and/or an interlayer. The barrier layer may form an interlayer that is a part of an electron amplifier positioned between an emissive layer and a resistive layer. The barrier layer is resistive to fluorine migration from either the emissive layer or the resistive layer.

Barrier coatings

The fabrication of robust interfaces between transition metal oxides and non-aqueous electrolytes is one of the great challenges of lithium ion batteries. Atomic layer deposition (ALD) of aluminum tungsten fluoride (AlWF) improves the electrochemical stability of LiCoO. AlWFthin films were deposited by combining trimethylaluminum and tungsten hexafluoride. in-situ quartz crystal microbalance and transmission electron microscopy studies show that the films grow in a layer-by-layer fashion and are amorphous nature. Ultrathin AlWFcoatings (<10 Å) on LiCoOsignificantly enhance stability relative to bare LiCoOwhen cycled to 4.4 V. The coated LiCoO2 exhibited superior rate capability (up to 400 mA/g) and discharge capacities at a current of 400 mA/g were 51% and 92% of the first cycle capacities for the bare and AlWFcoated materials. These results open new possibilities for designing ultrathin and electrochemically robust coatings of metal fluorides via ALD to enhance the stability of Li-ion electrodes.

Metal fluoride passivation coatings prepared by atomic layer deposition for Li-ion batteries

Coated nanofibers and methods for forming the same. A magnetic nanofiber is formed and a barrier coating is deposited on the magnetic nanofiber by atomic layer deposition ('ALD') process. The coated nanofiber may include a reduced magnetic nanostructure and a barrier coating comprising a first oxide coating on the nanofiber, the coating being non-reactive with the magnetic polymer nanofiber, the barrier coating have a thickness of 2 nm to 12 nm.

Creating and protecting magnetic nanomaterials

The sequential infiltration synthesis (SIS) and Atomic Layer Deposition (ALD) of metal and/or metal oxides on personal medical equipment (PPE). The deposited metal and/or metal oxides imbues antimicrobial properties to the PPE.

Antimicrobial coatings

ALD and p-CVD methods to generate MgBand MgB-containing films in the growth temperature range of 250-300&#xb0; C. The thermal ALD and p-CVD methods shown herein ensure that the high-temperature-induced roughening, which causes high surface resistances in MgBcoatings grown by the mentioned conventional techniques, is avoided. The MgBand MgB-containing films exhibit superconductive properties at above 20&#xb0; K.

Methods for low-temperature p-CVD and thermal ALD of magnesium diboride

Transition metal dichalcogenides (TMDs) are deposited as thin layers on a substrate. The TMDs may be grown on oxide substrates and may have a tunable TMD-oxide interface.

Methods to deposit controlled thin layers of transition metal dichalcogenides

Selective receiver coatings provide high performance for concentrated solar power applications. The solar selective coating provides high solar absorptivity (90% or greater) with low IR emissivity (0.1 or less) while maintaining stability at temperatures greater than 700&#xb0; C. The coating comprises a composite of a mesoporous photonic matrix with a conformal optical coating. One example composite coating includes a mesoporous photonic coating comprising a plurality of particles having sizes between 100 nm and 2000 nm, and a conformal optical coating formed by Atomic Layer Deposition (ALD) that infiltrates the mesoporous structure of the photonic coating and comprises metal nanoparticles and an amorphous dielectric matrix.

Refractory solar selective coatings

A process for forming a lithium-metal-carbon film on a lithium metal structure. A metal-ligand complex is exposed to the metal ligand, such as for 5-30 seconds in a chemical vapor transfer reactor at a temperature of 100-180&#xb0; C.

Formation of lithium-metal-carbon protecting layer and removal of lithium carbonate on lithium metal

Time projection chambers are useful for high energy particle physics, nuclear physics, and astronomy. To enhance the particle detection efficiency and performance of the projection chambers functional bilayer thin film coatings based on the atomic layer deposition method are utilized. Coating material selection is based on Auger neutralization process ion induced electron emission from metallic surfaces (e.g., Mo or W) combined with a high secondary electron emission coefficient. Application of high secondary electron emission materials (e.g., MgO and CaF2) enhances the multiplication of these emitted electrons from ion induction processes. Therefore, using suitable bilayer coatings the overall TPC signal detection efficiency can be increased.

Method of creating structure for particle detection in time projection chambers and photodetectors

Transition metal dichalcogenides (TMDs) are deposited by atomic layer deposition as thin layers on a substrate. The TMDs may be grown on oxide substrates and may have a tunable TMD-oxide interface. The TMD may be etched using an atomic layer etching technique.

Methods to deposit and etch controlled thin layers of transition metal dichalcogenides

A system and method for improved atomic layer deposition. The system includes a top showerhead plate, a substrate and a bottom showerhead plate. The substrate includes a porous microchannel plate and a substrate holder is positioned in the system to insure flow-through of the gas precursor.

ALD reactor for coating porous substrates

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Naperville, IL, United States of America

Anil U Mane