Carl Zeiss Microscopy Gmbh

Applied Materials Israel Limited

Anger Pascal

Dirk Zeidler

Thomas Kemen

Christof Riedesel

Antonio Casares

The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (); a first multi-aperture plate () having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate () having plural apertures; a carrier (), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator () configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

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Aalen, Germany

Anger Pascal