Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Angelo Cesar Peter De Klerk

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Frits Van Der Meulen

Sven Antoin Johan Hol

Paul Janssen

Derk Servatius Gertruda Brouns

Robert Gabriël Maria Lansbergen

Matthias Kruizinga

Jeroen Dekkers

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Gerrit Van Den Bosch

Jérôme François Sylvain Virgile Van Loo

Maarten Mathijs Marinus Jansen

Ronald Harm Gunther Kramer

Marc Bruijn

Silvester Matheus Reijnders

Jorge Manuel Azeredo Lima

Frank Johannes Christiaan Theuerzeit

Anne Johannes Wilhelmus Van Lievenoogen

Geert Middel

Michel Loos

Roland Jacobus Johannes Kerstens

Maurice Leonardus Johannes Janssen

Jacobus Maria Dings

Jan Van Eijk

Arjan Franklin Bakker

Fransicus Mathijs Jacobs

Mark Scholten

Martinus Jozef Maria Kester

Harmen Klaas Van Der Schoot

Johan Cornelis Compter

Thomas Petrus Hendricus Warmerdam

Hubert Gerard Jean Joseph Amaury Vroomen

Dennis Erwin Bos

Franciscus Martinus Roes

Martinus Jozef Maria Kesters

Jerome Francois Sylvain Virgile Van Loo

Robert Gabriel Maria Lansbergen

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Pellicle attachment apparatus

A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.

A cooling apparatus is described that has a first cooling structure, in thermal contact with a heat source having a temperature greater than a cool structure, including a channel through which a cooling fluid is passed, an isolator between the heat source and the cool structure, the isolator in thermal contact with the first cooling structure and including a material of low thermal conductivity, and a second cooling structure between the isolator and the cool structure, the second cooling structure including a channel through which cooling fluid is passed.

Apparatus for cooling

A motor includes a magnet assembly to generate a magnetic field. The field includes along the first direction parts which are alternately orientated in the first and the second direction. The parts extend in a third direction which is perpendicular to the first and the second direction. The motor further includes a first coil winding to carry a first current. The first coil winding to extend in the first direction between parts of the magnetic field orientated in the second direction, to generate the force in the first direction. The motor also includes a second coil winding to carry a second current. The second coil winding to extend in the first direction between parts of the magnetic field substantially orientated in the first direction, to generate the force in the second direction.

Lithographic apparatus and motor

A apparatus processes an object (), such as a semi-conductor wafer at accurately controlled positions. The object () is supported by a working platform () that is moveable along a path. A suspension actuator part () attached to the working platform (), contains a soft magnetic core () with poles facing the surface of a soft magnetic element () on the support structure along the path and a winding () for application of a current to generate a magnetic field that runs through the core () v the poles and returns via the soft magnetic element (). A sensor () senses a measured position of the suspension actuator part () relative to the position reference element (). A control circuit comprises an outer control circuit () and an inner control circuit (). The outer control circuit () receives a sensing result and determines force set point information to regulate the measured position of the actuator part () to a required value. The inner control circuit () receives the force set point information and controls the current to realize a force between the actuator part () and the support structure () according to the force set point information.

Apparatus for processing an object with high position accurancy

A Lorentz actuator provides a force between a first part and a second part of the apparatus, comprising a main magnet system, attached to a first part of the apparatus and providing a first magnetic field; a subsidiary magnet system, attached to the first part and arranged in a Halbach configuration, providing a second magnetic field; and an electrically conductive element attached to a second part of the apparatus and arranged so as to produce a force between the first and second parts of the apparatus by interaction of an electric current carried by the electrically conductive element and the combination of the first and second magnetic fields.

Lithographic apparatus and motor for use in the apparatus

Growing community of inventors

Etten-Leur, Netherlands

Angelo Cesar Peter De Klerk