Shipley Company LLC

Rohm and Haas Company

Angelo Anthony Lamola

James W Thackeray

Robert H Gore

Yujian You

Michael K Gallagher

Robert Mitchell Blankenship

Nikoi Annan

Craig S Allen

Philip R Norris

Richard Martin Jacobson

Roger F Sinta

Edward E LaFleur

Garo Khanarian

Gary S Calabrese

The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the composition to a substrate; exposing the composition layer to activating radiation whereby a latent image is generated comprising a distribution of acid moieties complexed with the polar compound; and treating the exposed composition layer to provide an activating amount of acid.

Radiation sensitive compositions and methods

Methods of preparing porous optical materials are provided. These methods allow for the selection of the desired pore size and level of porosity in the porous optical material. Such methods utilize a preformed polymeric porogen.

Porous optical materials

Disclosed is a method of preparing emulsion polymers and a method of preparing porous dielectric materials using the emulsion polymers.

Polymer synthesis

The present invention relates to new delivery systems for cyclopropene compounds of a cyclopropene compound generator comprising at least one substrate, a material containing at least one cyclopropene compound and a release agent whereby at least one side of one substrate is coated with the material containing at least one cyclopropene compound and wherein when the material containing at least one cyclopropene compound is exposed to the release agent, a gaseous cyclopropene compound is released. The present invention also provides methods to release a cyclopropene compound from such a generator to deliver a cyclopropene compound to plants, fruits, flowers or vegetables to inhibit an ethylene response in the plants, fruits, flowers or vegetable.

Delivery systems for cyclopropene compounds

Radiation sensitive compositions comprising complexing polar compound and methods of use thereof

Porous dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous dielectric materials. Also disclosed are methods of forming integrated circuits containing such porous dielectric materials.

Porous materials

Porous organo polysilica dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous organo polysilica dielectric materials. Also disclosed are methods of forming integrated circuits containing such porous organo polysilica dielectric materials.

An improved process, preferably continuous, for the manufacture of gradient refractive index optical objects, wherein a core polymer, which itself may be prepared by a continuous and incorporated process, is passed through a hollow porous surrounding, generally cylindrical so as to obtain and maintain a rounded fiber, through which is fed a second monomer whose polymer has a lower refractive index than the core polymer, so as to swell the core polymer. The swollen polymer with a gradient of swelling by the second monomer from surface to core, is then led to a polymerization unit to complete the polymerization before equilibration of the second monomer throughout the core polymer occurs. The resulting polymers are useful in the preparation of optical fibers and light pipes.

Process for gradient refractive index optical objects

A photoacid-generating photoresist composition sensitized with an aromatic, multi-ring, heterocylcic nitrogen containing sensitizer, preferably a ring extended phenothiazine derivative. The use of the sensitizer permits exposure of photoresists to near UV irradiation where such photoresists have heretofore been exposed to deep UV irradiation. The invention is especially useful for acid hardening photoresist systems.

Growing community of inventors

Worcester, PA, United States of America

Angelo Anthony Lamola