Trumpf Huettinger Sp. Z O. O.

Ozimek, Pawel

Klimczak, Andrzej

Golan, Marcin

Zelechowski, Marcin

Huettinger Electronic Sp. Z O. O

Andrzej Klimczak

Pawel Ozimek

Rafal Bugyi

Marcin Golan

Marcin Zelechowski

Andrzej Gieraltowski

Michal Balcerak

Robert Dziuba

Konrad Lewandowski

A method of balancing voltage distribution over a plurality of switches connected in series with each other in a high voltage (HV) switch is provided. A snubber arrangement is associated with each switch of the plurality of switches. The method includes, for a first snubber arrangement associated with a first switch of the plurality of switches, determining a first voltage across a first snubber energy storage component of the first snubber arrangement associated with the first switch. The method further includes, for a second snubber arrangement associated with a second switch of the plurality of switches, determining a second voltage across a second snubber energy storage component of the second snubber arrangement associated with the second switch. The method further includes comparing the first voltage and the second voltage and, based on the comparison, adjusting a first drive signal of at least the first switch based on the first voltage.

HV switch unit with snubber arrangements

A high voltage (HV) switch unit includes a plurality of semiconductor switches connected with each other in series and configured to switch on and off simultaneously, and a plurality of series circuits. Each series circuit includes a snubber energy storage component and a snubber rectifying component. Each series circuit is connected parallel to each respective semiconductor switch. The HV switch unit further includes a voltage balancing circuit comprising a plurality of balancing electronic components in combination with a voltage limiting electronic component. The plurality of balancing electronic components forms a chain parallel to the serially connected semiconductor switches. The chain is configured to transport electrical charge from one snubber energy storage component to the next only in one direction. The voltage limiting electronic component is configured to limit a voltage at an end of the chain, where the electrical charge is transported to.

HV switch unit, pulsing assembly and method of avoiding voltage imbalances in an HV switch

A pulsing assembly for delivering power to a plasma reactor having a first load between a first plasma reactor input port and a plasma reactor common port and having a second load between a second plasma reactor input port and the plasma reactor common port. The pulsing assembly includes a first pulsing unit, a second pulsing unit and an energy storage component connected therebetween. The first pulsing unit includes a first input port connectable to a power source, a pulsing assembly common port connectable to the plasma reactor common port, a first output port connectable to the first load of the plasma reactor for supplying pulses between the first output port and the pulsing assembly common port. The second pulsing unit includes a second input port connectable to a power source and a second output port connectable to the second load of the plasma reactor.

Pulsing assembly and power supply arrangement

A balun configured for a power range between 500 W and 5 kW output includes a balanced signal port comprising a first connection and a second connection and further includes a single-ended signal port comprising a third connection and a fourth connection, the fourth connection being connected to ground. In addition, the balun includes a first capacitor disposed between the first connection and a first end of a first resistor and a second capacitor disposed between the second connection and the first end of the first resistor. A second end of the first resistor is connected to ground.

Balun and amplifier including balun

A power converter configured to generate a high-frequency power signal comprises at least one amplifier stage having first and second amplifier paths each having an amplifier, the first amplifier path outputting a first amplifier path output signal and the second amplifier path outputting a second amplifier path output signal that, has a phase shift relative to the first amplifier path output signal greater than 0&#xb0; and less than 180&#xb0;. The first and second amplifier paths are connected to a phase-shifting coupler that is configured to couple the first and second amplifier path output signals to form the high-frequency power signal. At least one amplifier of the first and second amplifier paths comprises a SiC MOSFET.

Power converter, power supply system and HF plasma system

An arc detector for detecting arcs in an RF plasma system includes at least two inputs configured to connect to an RF source, at least one output configured to connect to a plasma load, and a 3 dB coupler connected to the at least two inputs and the at least one output. The arc detector further includes a measuring device configured to measure at least two physical quantities transmitted between the 3 dB coupler and the at least one output, a determinator configured to determine an evaluation quantity based on the at least two physical quantities, and a differentiator configured to differentiate the evaluation quantity. The arc detector additionally includes a comparator configured to compare the output quantity of the differentiator with a reference value indicative of an arc.

Arc detector for detecting arcs, plasma system and method of detecting arcs

A method of generating a highly ionized plasma in a plasma chamber. A neutral gas is provided to be ionized in the plasma chamber at pressure below 50 Pa. At least one high energy high power electrical pulse is supplied with power equal or larger than 100 kW and energy equal or larger than 10 J, to at least one magnetron cathode in connection with a target in the plasma chamber. A highly ionized plasma is produced directly from the neutral gas in a plasma volume such that the plasma volume cross section increases during a current rise period. Atoms are sputtered from the target with the highly ionized plasma. At least part of the sputtered atoms are ionized.

Generating a highly ionized plasma in a plasma chamber

According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.

Reducing stored electrical energy in a lead inductance

An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling element for coupling RF power from the inductance into a plasma chamber.

Apparatus for generating and maintaining plasma for plasma processing

The current (I) flowing between a plasma chamber and a power supply is limited by limiting the current change di/dt if the current exceeds a predetermined current. A current change limiting device is provided in the current path between the power supply and the plasma chamber and is configured to determine if the current exceeds the predetermined current and limits the current change.

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Warsaw, Poland

Andrzej Klimczak