Saint-gobain Glass France

Andriy Kharchenko

Nicolas Nadaud

Anne Durandeau

Bernard Nghiem

Ulrich Billert

Georges Zagdoun

Vincent Reymond

Xavier Caillet

Rene Gy

Arnaud Huignard

René Gy

Ronan Garrec

Hadia Gerardin

Etienne Sandre-Chardonnal

Eddy Royer

Elin Sondergard

Bruno Mauvernay

Jean-Paul Rousseau

Pierre-Alain Gillet

Lorenzo Canova

Etienne Barthel

Emmanuelle Peter

Antje Jung

Christian Bernhard Petersen

Sébastien Roy

Emilie Thollas

Anne Lelarge

Sebastien Roy

Anne Lorren

A material includes a transparent substrate coated with a stack of thin layers including a silver-based functional metal layer and two dielectric coatings, wherein a lower dielectric coating located below a silver-based functional layer includes a high-index layer based on metal oxide, an antidiffusion layer based on silicon and/or on aluminum, at least one oxide-based layer located above the antidiffusion layer and exhibiting a different composition from the antidiffusion layer, such as a smoothing layer and/or a wetting layer.

Glazing including a stack of thin layers

The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising:

Method for obtaining a substrate coated with a functional layer by using a sacrificial layer

A process for producing a substrate coated on a face with a low-E thin film multilayer, the process including: depositing a thin-film multilayer containing a thin silver film between at least two thin dielectric films and an absorbent film on a face a substrate; and heat treating the coated face with laser radiation between 500 and 2000 nm to reduce at least one selected from the group of the emissivity and the sheet resistance of the multilayer by at least 5%, wherein the absorbent film at least partially absorbs the laser radiation so that the absorption of the multilayer the wavelength of the laser radiation is such that the absorption of a clear glass substrate 4 mm in thickness coated with the multilayer at the wavelength of the laser radiation is greater than or equal to 10%.

Thin film deposition method and resulting product

A process for manufacturing glazing including a substrate provided with a coating including a layer consisting of a porous material, includes depositing on the substrate, via a physical vapor deposition (PVD) process in a vacuum chamber, a coating including a layer of a material including an element selected from Si, Ti, Sn, Al, Zr, In or a mixture of at least two of these elements, oxygen and carbon, the layer in addition optionally including hydrogen, heat treatment of the layer thus deposited, under conditions that enable at least one portion of the carbon to be removed and the layer of porous material to be obtained, wherein the deposition is carried out, on the substrate passing through the chamber, by the sputtering of a carbon target, under a reactive plasma atmosphere including a precursor of the element or elements.

Process for manufacturing glazing comprising a porous layer

The subject of the invention is a process for obtaining a material comprising a substrate provided on at least one of its faces with a permanent coating comprising at least one thin film, said process comprising the following steps:

Method for producing a material including a substrate provided with a coating

A method of obtaining a substrate coated on a first face with at least one transparent and electrically conductive thin layer based on at least one oxide, including depositing the at least one thin layer on the substrate and subjecting the at least one thin layer to a heat treatment in which the at least one layer is irradiated with aid of radiation having a wavelength between 500 and 2000 nm and focused on a zone of the at least one layer, at least one dimension of which does not exceed 10 cm. The radiation is delivered by at least one radiation device facing the at least one layer, a relative displacement being created between the radiation device and the substrate to treat the desired surface, the heat treatment being such that resistivity of the at least one layer is reduced during the treatment.

Method for depositing a thin film, and resulting material

The subject of the invention is a material comprising a glass substrate coated on at least one of its faces with a thin-film multilayer comprising, starting from said substrate, at least one lower dielectric layer, at least one functional layer made of a metal or metal nitride, at least one upper dielectric layer and at least one layer of titanium oxide at least partially crystallized in the anatase form, said metal or metal nitride being based on Nb, NbN, W, WN, Ta, TaN or any of their alloys or solid solutions.

Material and glazing comprising said material

One subject of the invention is a process for the treatment of at least one thin continuous film deposited on a first side of a substrate, characterized in that said at least one thin film is raised to a temperature of at least 300&#xb0; C. while maintaining a temperature not exceeding 150&#xb0; C. on the opposite side of said substrate to said first side, so as to increase the degree of crystallization of said thin film while keeping it continuous and without a step of melting said thin film. Another subject of the invention is the material that can be obtained by this process.

Method for depositing a thin layer and product thus obtained

The subject of the invention is a process for obtaining a substrate coated on at least part of its surface with at least one film of oxide of a metal M the physical thickness of which is 30 nm or less, said oxide film not being part of a multilayer comprising at least one silver film, said process comprising the following steps:

Thin film deposition method

The subject of the invention is a process for obtaining a material comprising a substrate and at least one at least partially crystalline titanium-oxide-based thin film deposited on a first side of said substrate, said process comprising the following steps:

Method for thin layer deposition

The subject of the invention is the use of a material composed of a substrate equipped with a coating based on titanium oxide surmounted by a thin hydrophilic layer forming at least one part of the outer surface of said material and that is not composed of titanium oxide, as a material that prevents the deposition of mineral soiling on said outer surface in the absence of water runoff.

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Palaiseau, France

Andriy Kharchenko