Canon Kabushiki Kaisha

Andrew Robert Eckert

Kosta S Selinidis

Ahmed M Hussein

Ecron D Thompson

Some devices, systems, and methods calculate a transition region periodicity as a least a common multiple of a first periodicity of a first uniform-feature segment and a second periodicity of a second uniform-feature segment; determine a plurality of periodic elements of the transition region based on the transition region periodicity; determine a number of drops for each periodic element of the plurality of periodic elements of the transition region based on a volume requirement of the periodic element; and select, for each periodic element of the plurality of periodic elements of the transition region, a transition-region drop pattern that has the number of drops and that minimizes a metric that is a weighted sum of inverse distances between drops in the periodic element and drops in the first uniform-feature segment and the second uniform-feature segment that are adjacent to the periodic element.

Systems, devices, and methods for generating drop patterns

An imprint lithography template including an alignment mark including at least two columns or at least two rows of features spaced apart from one another, and a dummy-fill region, wherein the alignment mark is spaced apart from the dummy-fill region, and wherein a closest distance between the at least two columns or the at least two rows is less than a closest distance between any portion of the at least two columns or the at least two rows and the dummy-fill region. In an embodiment, the at least two columns or the at least two rows are spaced apart by at least 0.5 microns. In a further embodiment, the closest distance between the at least two columns or the at least two rows and the dummy-fill region is at least 2 microns.

Imprint lithography template, system, and method of imprinting

A template for imprint lithography can include an active area that includes a plurality of tiers including a first tier and a second tier, and a first feature within the first tier or the second tier. In another embodiment, the first and second tiers include features, and the average feature depth or height within the first tier may be substantially the same as or different from the average feature depth or height within the second tier. The template can be used in imprinting a formable layer to form a patterned resist layer over a device substrate that has at least two tiers. The template and its use are well suited for device substrates having exposed surfaces at significantly different elevations, particularly where planarization would be complicated or nearly impossible to implement.

Growing community of inventors

Pflugerville, TX, United States of America

Andrew Robert Eckert