Lam Research Corporation

Andrew Paul Eib

Gary B Lind

Sushanth Kondi

Vinayakaraddy Gulabal

Robert McKinney

Eddie Ze Thean Ooi

Vishnu Sai Yalamarty

Mahendra Byrapura Manjunath

Pedestal for a substrate processing system

A cleaning apparatus for a vacuum pedestal and method of cleaning a pedestal used in semiconductor device fabrication are described. The apparatus has a baseplate, a collar attached to the baseplate, a cap disposed on the collar, and a shaft that extends from the collar through the cap, collar and baseplate. A manual rotatable handle is attached to a shaft portion that extends from the cap. Motion of the handle in a downward direction is impeded by the cap. A disk is attached to a lower portion of the shaft and is separated from a bottom of the baseplate due to weighted rings, which are attached to the disk and surround the lower portion of the shaft such that a vertical float is present between the shaft and the cap. At least one abrasive pad is attached to the disk to remove build-up on the underlying pedestal surface.

Pedestal polishing apparatus

Growing community of inventors

San Jose, CA, United States of America

Andrew Paul Eib