Applied Materials, Inc.

Nantomics, LLC

Asml Holding N.v.

Cloudshield Technologies, Inc.

Nant Holdingsip, LLC

Kla Tencor Corporation

Kla Corporation

Asml Holdings N.v.

Acclarent, Inc.

Nantcell, Inc.

Asml Us, Inc.

Transposit Corporation

Cloudshield Teechnologies, Inc.

Andrew Nguyen

Kartik Ramaswamy

Kenneth S Collins

Hiroji Hanawa

Amir Hamed Al-Bayati

Shahid Rauf

Biagio Gallo

James D Carducci

Douglas A Buchberger, Jr

Ajit Balakrishna

James P Cruse

Yogananda Sarode Vishwanath

Tsutomu Tanaka

Stephen Charles Benz

Yan Ye

Kallol Bera

Lawrence Wong

Zhigang Chen

Hamid Tavassoli

Kayvan R Niazi

Martin Jeffrey Salinas

Jennifer Y Sun

Abhilash J Mayur

Shahrooz Rabizadeh

Dean C Jennings

John Zachary Sanborn

Steven C Shannon

Jared Ahmad Lee

Vijay Parihar

Yang Yang

Tom K Cho

Matthew L Miller

Steven Lane

Peder J Jungck

Walter R Merry

Patrick Soon-Shiong

Daniel John Hoffman

Valentin Nikolov Todorow

Leonid Dorf

Paul Benjamin Reuter

Ankur Agarwal

Ming Xu

Michael C Kutney

Imad Yousif

Tza-Jing Gung

Charles Joseph Vaske

Benjamin Schwarz

Srinivas D Nemani

Tetsuya Ishikawa

Xianmin Tang

Yu Lei

Michael D Willwerth

Samer Banna

Richard Charles Fovell

Brian C Lue

Dmitry Lubomirsky

Philip Allan Kraus

Li Zhang

Xikun Wang

Mei H Sun

Nicolas J Bright

Meihua Shen

Canfeng Lai

Dermot Cantwell

Tae Hong Ha

Michael C Kuchar

Evans Yip Lee

Roger Alan Lindley

Haitao Wang

Fernando Silveira

Michael Robert Rice

Michael S Barnes

Ketan P Muni

John C Forster

Dan Maydan

Eric Andrew Englhardt

Majeed Foad

Hung V Ha

Gerald Z Yin

Jay D Pinson, Ii

Keiji Horioka

Ren-Guan Duan

Yue Guo

Akihiro Hosokawa

Chunlei Zhang

Douglas Buchberger

Toan Q Tran

Peter I Porshnev

Satoru Kobayashi

Ezra Robert Gold

Bhaskar Kumar

Robert W Wu

David Palagashvili

Hong Sheng Yang

John William Lane

Mariusch Gregor

Qingjun Zhou

Tom K Choi

Corie Lynn Cobb

Effectiveness of a neoepitope-based immunotherapeutic composition against a tumor can be increased by predicting the surface presentation of the neoepitope bound to the HLA molecule of the tumor cell. Surface presentation levels of neoepitopes can be predicted by identifying any changes in omics data of the tumor cell that may affect the expression or surface trafficking of the HLA molecule and that may affect binding affinities of neoepitopes to the HLA molecule.

Tumor HLA mutation versus matched normal HLA

Described is a process to clean up junction interfaces for fabricating semiconductor devices involving forming low-resistance electrical connections between vertically separated regions. An etch can be performed to remove silicon oxide on silicon surface at the bottom of a recessed feature. Described are methods and apparatus for etching up the bottom oxide of a hole or trench while minimizing the effects to the underlying epitaxial layer and to the dielectric layers on the field and the corners of metal gate structures. The method for etching features involves a reaction chamber equipped with a combination of capacitively coupled plasma and inductive coupled plasma. CHFgases and plasma are used to form protection layer, which enables the selectively etching of bottom silicon dioxide by NH—NFplasma. Ideally, silicon oxide on EPI is removed to ensure low-resistance electric contact while the epitaxial layer and field/corner dielectric layers are—etched only minimally or not at all.

Directional selective junction clean with field polymer protections

Aspects of the present disclosure generally relate to apparatus and methods for an adjustable de-chucking voltage associated with an electrostatically charged substrate in a processing chamber. An example method of de-chucking a substrate disposed in a process chamber includes processing a substrate in a chamber body, the substrate being coupled to a substrate support comprising a chucking electrode. The method further includes monitoring a property associated with a lift pin assembly movable relative to the chucking electrode via an actuator. The method further includes adjusting a first voltage level applied to the chucking electrode in response to the property associated with the lift pin assembly satisfying one or more criteria.

Adjustable de-chucking voltage

Certain universal neoepitopes and cancer specific neoepitopes and methods therefor are presented that may be used in immunotherapy and cancer diagnosis. Preferred therapeutic and diagnostic compositions include antibodies or fragments thereof that bind to neoepitopes on cancer cells.

AGGF1 immunogenic compositions

Methods and systems for in-situ temperature control are provided. The method includes delivering a temperature-sensing disc into a processing region of a processing chamber without breaking vacuum. The temperature-sensing disc includes one or more cameras configured to perform IR-based imaging. The method further includes measuring a temperature of at least one region of at least one chamber surface in the processing region of the processing chamber by imaging the at least one surface using the temperature-sensing disc. The method further includes comparing the measured temperature to a desired temperature to determine a temperature difference. The method further includes adjusting a temperature of the at least one chamber surface to compensate for the temperature difference.

In-situ semiconductor processing chamber temperature apparatus

Exemplary methods of manufacturing a semiconductor cover wafer may include sintering aluminum nitride particles into a substrate characterized by a thickness and characterized by a disc shape. The methods may include grinding a surface of the substrate to reduce the thickness to less than or about 2 mm. The methods may include polishing the surface of the substrate to reduce a roughness. The methods may include annealing the substrate at a temperature of greater than or about 800° C. for a time period of greater than or about 60 minutes.

Stress treatments for cover wafers

Methods and apparatus for forming plasma in a process chamber use an annular exciter formed of a first conductive material with a first end electrically connected to an RF power source that provides RF current and a second end connected to a ground and an annular applicator, physically separated from the annular exciter, formed of a second conductive material with at least one angular split with an angle forming an upper overlap portion and a lower overlap portion separated by a high K dielectric material which is configured to provide capacitance in conjunction with an inductance of the annular applicator to form a resonant circuit that is configured to resonate when the annular exciter flows RF current that inductively excites the annular applicator to a resonant frequency which forms azimuthal plasma from the annular applicator.

Methods and apparatus for toroidal plasma generation

Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes: a chamber liner having a tubular body with an upper portion and a lower portion; a confinement plate coupled to the lower portion of the chamber liner and extending radially inward from the chamber liner, wherein the confinement plate includes a plurality of slots; a shield ring disposed within the chamber liner and movable between the upper portion of the chamber liner and the lower portion of the chamber liner; and a plurality of ground straps coupled to the shield ring at a first end of each ground strap of the plurality of ground straps and to the confinement plate at a second end of each ground strap to maintain electrical connection between the shield ring and the chamber liner when the shield ring moves.

Metal oxide preclean chamber with improved selectivity and flow conductance

Examples of the present invention include a method for removing halogen-containing residues from a substrate. The method includes transferring a substrate to a substrate processing system through a first chamber volume of a load lock chamber. The load lock chamber is coupled to a transfer chamber of the substrate processing system. The substrate is etched in one or more processing chambers coupled to the transfer chamber of the substrate processing system with chemistry from a showerhead disposed over a heated substrate support assembly. The chemistry includes halogen. Halogen-containing residues are removed from the etched substrate in a second chamber volume of the load lock chamber. Cooling the etched substrate in a cooled substrate support assembly of the load lock chamber after removing the halogen-containing residue.

Abatement and strip process chamber in a load lock configuration

Contemplated antiviral/cancer treatments comprise analysis of neoepitopes from viral DNA that has integrated into the host genome, and design of immunotherapeutic agents against such neoepitopes.

Viral neoepitopes and uses thereof

Embodiments disclosed herein include a method for cleaning a bevel area of a substrate support disposed within a plasma processing chamber. In one example the method begins by placing a cover substrate on a substrate support disposed in an interior volume of a processing chamber. A cleaning gas is provided into the interior volume of the processing chamber. A plasma is struck in the interior volume of the processing chamber. A cleaning gas is provided through the substrate support to a bevel edge area defined between an outer diameter of the cover substrate and an edge ring disposed on the substrate support.

Situ clean for bevel and edge ring

An apparatus for processing a substrate is disclosed and includes, in one embodiment, a twin chamber housing having two openings formed therethrough, a first pump interface member coaxially aligned with one of the two openings formed in the twin chamber housing, and a second pump interface member coaxially aligned with another of the two openings formed in the twin chamber housing, wherein each of the pump interface members include three channels that are concentric with a centerline of the two openings.

Chamber body design architecture for next generation advanced plasma technology

Embodiments of the present disclosure generally relate to semiconductor processing equipment, and more specifically to apparatus, e.g., magnet holding structures, that can be used with magnets during plasma processing of a substrate. In an embodiment, a magnet holding structure for a plasma-enhanced chemical vapor deposition chamber is provided. The magnet holding structure includes a top piece having a plurality of magnet retention members and a bottom piece having a plurality of magnet retention members. The top piece has a first inside edge and a first outside edge, and the bottom piece has a second inside edge and a second outside edge. The magnet holding structure further includes a plurality of casings. Each casing of the plurality of casings is configured to at least partially encapsulate a magnet, and each casing positioned between a magnet retention member of the top piece and a magnet retention member of the bottom piece.

Magnetic holding structures for plasma processing applications

A plasma chamber includes a chamber body having a processing region therewithin, a liner disposed on the chamber body, the liner surrounding the processing region, a substrate support disposed within the liner, a magnet assembly comprising a plurality of magnets disposed around the liner, and a magnetic-material shield disposed around the liner, the magnetic-material shield encapsulating the processing region near the substrate support.

Magnetic-material shield around plasma chambers near pedestal

Systems and methods for prediction of the treatment outcome for immune therapy are presented in which omics data of a patient tumor sample are used. Most typically, the omics data are processed to identify mutational signatures (especially APOBEC/POLE signatures), immune checkpoint expression, and MSI status as leading indicators to predict the treatment outcome for immune therapy. Such prediction advantageously integrates various parameters that would otherwise, when individually considered, skew prediction outcome.

Immunotherapy markers and uses therefor

Growing community of inventors

San Jose, CA, United States of America

Andrew Nguyen