Chartered Semiconductor Manufacturing Ltd (corporation)

Andrew Khoh

Lap Chan

Sia Kim Tan

Qunying Lin

Ganesh S Samudra

Yihong Wu

Byong-Il Choi

An integrated circuit system comprising: providing a substrate; forming a main feature using a first non-cross-junction assist feature over the substrate; forming the main feature using a second non-cross-junction assist feature, adjacent a location of the first non-cross-junction feature, over the substrate; and forming an integrated circuit having the substrate with the main feature thereover.

Integrated circuit system with assist feature

A trial semiconductor photomask design having discontinuity points is provided, and each of the discontinuity points is treated as simulated light sources. Simulated light from each of the simulated light sources is focused, and a composite image intensity of the focused simulated light is calculated to verify the trial semiconductor photomask design. The trial semiconductor photomask design is sharpened. A photomask design specification is generated for use in fabricating such a photomask.

System and method for designing semiconductor photomasks

Growing community of inventors

Singapore, Singapore

Andrew Khoh