Asml Holding N.v.

Asml Netherlands B.v.

Andrew Judge

Aage Bendiksen

Marcus Adrianus Van De Kerkhof

Justin Lloyd Kreuzer

Theodorus Marinus Modderman

Joseph Harry Lyons

Derk Servatius Gertruda Brouns

James Hamilton Walsh

Ronald Peter Albright

Manish Ranjan

Joshua Adams

Victor Antonio Perez-Falcon

Michal Emanuel Pawlowski

Richard Jacobs

Daniel Leslie Hall

Pedro Julian Rizo Diago

Jeffrey John Lombardo

Ravi Chaitanya Kalluri

Veera Venkata Narasimha Narendra Phani Kottapalli

Xugang Xiong

An inspection system (), a lithography apparatus, and an inspection method are provided. The inspection system () includes an illumination system (), a detection system (), and processing circuitry (). The illumination system generates a first illumination beam () at a first wavelength and a second illumination beam () at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object () simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation () scattered by a particle () present at a surface () of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.

Contaminant identification metrology system, lithographic apparatus, and methods thereof

An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

Apparatus and method for determining a condition associated with a pellicle

Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.

Apparatus for and method of in-situ particle removal in a lithography apparatus

A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller. The camera module is designed to capture image data of a backside of the patterning device. The actuator is coupled to at least one burl of the plurality of burls and is designed to move the at least one burl. The controller is designed to receive the image data captured from the camera module and determine one or more locations of contamination on the backside of the patterning device from the image data. The controller is also designed to control the actuator to move the at least one burl of the plurality of burls away from the one or more locations of contamination on the backside of the patterning device, based on the determined locations of contamination.

Control of reticle placement for defectivity optimization

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Monroe, CT, United States of America

Andrew Judge